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1. (WO2012170368) A CHEMICAL BATH DEPOSITION APPARATUS FOR FABRICATION OF SEMICONDUCTOR FILMS THROUGH ROLL-TO-ROLL PROCESSES
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2012/170368 International Application No.: PCT/US2012/040817
Publication Date: 13.12.2012 International Filing Date: 05.06.2012
IPC:
H01L 31/18 (2006.01) ,B05C 11/00 (2006.01) ,C23C 16/30 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
18
Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
C
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
11
Component parts, details or accessories not specifically provided for in groups B05C1/-B05C9/132
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
Applicants:
WANG, Jiaxiong [US/US]; US
Inventors:
WANG, Jiaxiong; US
Priority Data:
13/154,48107.06.2011US
Title (EN) A CHEMICAL BATH DEPOSITION APPARATUS FOR FABRICATION OF SEMICONDUCTOR FILMS THROUGH ROLL-TO-ROLL PROCESSES
(FR) APPAREIL DE DÉPÔT PAR BAIN CHIMIQUE POUR FABRIQUER DES FILMS DE SEMI-CONDUCTEURS PAR DES PROCÉDÉS ROULEAU-À-ROULEAU
Abstract:
(EN) A chemical bath deposition method and a system are presented to prepare thin films on continuous flexible substrates in roll-to-roll processes. In particular, they are useful to deposit CdS or ZnS buffer layers in manufacture of thin film solar cells. This method and its deposition system deposit thin films onto vertically travelling continuous flexible workpieces delivered by a roll-to-roll system. The thin films are deposited with continuously spraying reaction solutions from their freshly mixed styles to gradually aged forms until a designed thickness is obtained. The substrates and the solutions are heated to a reaction temperature. During a deposition process, the front surface of a flexible substrate is totally covered with the sprayed solutions but the substrate backside is dry. Reaction ambience inside the reactor can be isolated from outside atmosphere. The apparatus is designed to generate a minimum amount of waste solutions for chemical treatments.
(FR) L'invention présente un procédé de dépôt par bain chimique et un système pour préparer des films minces sur des substrats flexibles continus dans des procédés rouleau-à-rouleau. En particulier, ils sont utiles pour déposer des couches tampons de CdS ou ZnS dans la fabrication de cellules solaires en couches minces. Ce procédé et son système de dépôt permettent de déposer des films minces sur des pièces à travailler flexibles continues se déplaçant verticalement distribuées par un système rouleau-à-rouleau. Les films minces sont déposés par pulvérisation en continu de solutions de réaction de leurs formulations fraîchement mélangées à des formes progressivement vieillies jusqu'à ce qu'une épaisseur désignée soit obtenue. Les substrats et les solutions sont chauffés à une température de réaction. Pendant un procédé de dépôt, la surface avant d'un substrat flexible est totalement recouverte par les solutions pulvérisées mais le côté arrière du substrat est sec. L'atmosphère de réaction à l'intérieur du réacteur peut être isolée de l'atmosphère extérieure. L'appareil est conçu pour générer une quantité minimale de solutions de rebut pour des traitements chimiques.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
CN103582956