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1. (WO2012166727) SUBSTRATE FREEZE DRY APPARATUS AND METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2012/166727 International Application No.: PCT/US2012/039855
Publication Date: 06.12.2012 International Filing Date: 29.05.2012
IPC:
H01L 21/302 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
Applicants:
LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway Fremont, California 94538, US (AllExceptUS)
SIRARD, Stephen M. [US/US]; US (UsOnly)
HYMES, Diane [US/US]; US (UsOnly)
SCHOEPP, Alan M. [US/US]; US (UsOnly)
Inventors:
SIRARD, Stephen M.; US
HYMES, Diane; US
SCHOEPP, Alan M.; US
Agent:
LEE, Michael; Beyer Law Group LLP P.O. Box 1687 Cupertino, California 95015, US
Priority Data:
13/273,09013.10.2011US
61/491,72731.05.2011US
Title (EN) SUBSTRATE FREEZE DRY APPARATUS AND METHOD
(FR) APPAREIL ET PROCÉDÉ DE LYOPHILISATION D'UN SUBSTRAT
Abstract:
(EN) An apparatus for freeze drying a substrate is provided. A chamber for receiving a substrate is provided. An electrostatic chuck (ESC) for supporting and electrostatically clamping the substrate is within the chamber. A temperature controller controls the temperature of the electrostatic chuck. A condenser is connected to the chamber. A vacuum pump is in fluid connection with the chamber.
(FR) L'invention porte sur un appareil de lyophilisation d'un substrat. On prépare une chambre destinée à recevoir un substrat. On place dans la chambre un mandrin électrostatique (ESC) destiné à supporter et à serrer le substrat par voie électrostatique. Une unité de commande de la température commande la température du mandrin électrostatique. On relie un condenseur à la chambre. Une pompe à vide est en communication fluidique avec la chambre.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
CN103650116JP2014523636