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1. WO2012144904 - POSITION DETERMINATION IN A LITHOGRAPHY SYSTEM USING A SUBSTRATE HAVING A PARTIALLY REFLECTIVE POSITION MARK

Publication Number WO/2012/144904
Publication Date 26.10.2012
International Application No. PCT/NL2012/050271
International Filing Date 23.04.2012
IPC
G03F 9/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
CPC
G03F 9/7076
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
70for microlithography
7073Alignment marks and their environment
7076Mark details, e.g. phase grating mark, temporary mark
G03F 9/7088
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
70for microlithography
7088Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Applicants
  • MAPPER LITHOGRAPHY IP B.V. [NL]/[NL] (AllExceptUS)
  • VERGEER, Niels [NL]/[NL] (UsOnly)
  • DE BOER, Guido [NL]/[NL] (UsOnly)
Inventors
  • VERGEER, Niels
  • DE BOER, Guido
Agents
  • PETERS, Sebastian Martinus
Priority Data
61/478,12622.04.2011US
61/491,86231.05.2011US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) POSITION DETERMINATION IN A LITHOGRAPHY SYSTEM USING A SUBSTRATE HAVING A PARTIALLY REFLECTIVE POSITION MARK
(FR) DÉTERMINATION D'UNE POSITION DANS UN SYSTÈME DE LITHOGRAPHIE À L'AIDE D'UN SUBSTRAT DOTÉ D'UN REPÈRE PARTIELLEMENT RÉFLÉCHISSANT
Abstract
(EN)
The invention relates to a substrate for use in a lithography system, said substrate being provided with an at least partially reflective position mark comprising an array of structures, the array extending along a longitudinal direction of the mark, characterized in that said structures are arranged for varying a reflection coefficient of the mark along the longitudinal direction, wherein said reflection coefficient is determined for a predetermined wavelength. In an embodiment a specular reflection coefficient varies along the substrate, wherein high order diffractions are substantially absorbed by the substrate. A position of a beam on a substrate can thus be determined based on the intensity of its reflection in the substrate. The invention further relates to a positioning device and lithography system for cooperation with the substrate, and a method of manufacture of the substrate.
(FR)
L'invention concerne un substrat à utiliser dans un système de lithographie, ledit substrat étant doté d'un repère au moins partiellement réfléchissant comportant un réseau de structures, ledit réseau s'étendant dans une direction longitudinale du repère, caractérisé en ce que ces structures sont disposées pour faire varier un coefficient de réflexion du repère dans la direction longitudinale, ledit coefficient de réflexion étant déterminé pour une longueur d'onde prédéterminée. Dans un mode de réalisation, un coefficient de réflexion spéculaire varie le long du substrat, des diffractions d'ordre supérieur étant sensiblement absorbées par le substrat. Une position d'un faisceau sur un substrat peut ainsi être déterminée sur la base de l'intensité de sa réflexion dans le substrat. L'invention concerne également un dispositif de positionnement et un système de lithographie destiné à coopérer avec le substrat, et un procédé de production du substrat.
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