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1. WO2012137787 - NEUTRAL BEAM FORMATION DEVICE, SURFACE ANALYSIS DEVICE, NEUTRAL BEAM FORMATION METHOD, AND SURFACE ANALYSIS METHOD

Publication Number WO/2012/137787
Publication Date 11.10.2012
International Application No. PCT/JP2012/059108
International Filing Date 03.04.2012
IPC
H05H 3/02 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
3Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
02Molecular or atomic-beam generation, e.g. resonant beam generation
G01N 23/20 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/-G01N17/178
20by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
G01N 23/225 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/-G01N17/178
22by measuring secondary emission from the material
225using electron or ion microprobes
H01J 37/04 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
CPC
G01N 23/2255
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00G01N17/00, G01N21/00 or G01N22/00
22by measuring secondary emission from the material
225using electron or ion
2255using incident ion beams, e.g. proton beams
H01J 2237/0041
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
004Charge control of objects or beams
0041Neutralising arrangements
H05H 3/02
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
3Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
02Molecular or atomic beam generation
Applicants
  • 株式会社パスカル PASCAL CO.,LTD. [JP]/[JP] (AllExceptUS)
  • 中西 繁光 NAKANISHI Shigemitsu [JP]/[JP] (UsOnly)
  • 東堤 秀明 HIGASHITSUTSUMI Hideaki [JP]/[JP] (UsOnly)
Inventors
  • 中西 繁光 NAKANISHI Shigemitsu
  • 東堤 秀明 HIGASHITSUTSUMI Hideaki
Agents
  • 渡辺 征一 WATANABE Seiichi
Priority Data
2011-08648508.04.2011JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) NEUTRAL BEAM FORMATION DEVICE, SURFACE ANALYSIS DEVICE, NEUTRAL BEAM FORMATION METHOD, AND SURFACE ANALYSIS METHOD
(FR) DISPOSITIF DE FORMATION DE FAISCEAU NEUTRE, DISPOSITIF D'ANALYSE DE SURFACE, PROCÉDÉ DE FORMATION DE FAISCEAU NEUTRE ET PROCÉDÉ D'ANALYSE DE SURFACE
(JA) 中性粒子ビーム形成装置、表面分析装置、中性粒子ビーム形成方法、および表面分析方法
Abstract
(EN)
[Problem] To provide a neutral beam formation device, surface analysis device that uses the same, neutral beam formation method, and surface analysis method capable of measuring the intensity of a neutral beam. [Solution] The present invention is characterized in comprising: a neutralization chamber (3) for introducing a neutral gas and using the neutral gas to neutralize and convert an ion beam to a neutral beam; and a neutral beam intensity monitoring mechanism for monitoring the intensity of the neutral beam. The neutral beam intensity monitoring mechanism measures the charge of charged particles produced when the neutral gas is charged by the charge exchange reaction between the neutral gas and the ion beam.
(FR)
L'invention concerne un dispositif de formation de faisceau neutre, un dispositif d'analyse de surface l'utilisant, un procédé de formation de faisceau neutre et un procédé d'analyse de surface capable de mesurer l'intensité d'un faisceau neutre. La présente invention est caractérisée en ce qu'elle comporte : une chambre (3) de neutralisation servant à introduire un gaz neutre et à utiliser le gaz neutre pour neutraliser et convertir un faisceau d'ions en faisceau neutre ; et un mécanisme de surveillance de l'intensité du faisceau neutre servant à surveiller l'intensité du faisceau neutre. Le mécanisme de surveillance de l'intensité du faisceau neutre mesure la charge de particules chargées produites lorsque le gaz neutre est chargé par la réaction d'échange de charges entre le gaz neutre et le faisceau d'ions.
(JA)
【課題】 中性粒子ビームの強度を測定することができる、中性粒子ビーム形成装置、それを用いた表面分析装置、中性粒子ビーム形成方法、および表面分析方法を提供する。 【解決手段】 中性ガスを導入してイオンビームを該中性ガスにより中性化して中性粒子ビームに変換する中性化室3と、中性粒子ビームの強度をモニタする中性粒子ビーム強度モニタ機構とを備え、中性粒子ビーム強度モニタ機構は、中性ガスとイオンビームとの電荷交換反応によって中性ガスが帯電して生じる帯電粒子の電荷を計測する機構であることを特徴とする。
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