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1. (WO2012129162) METHODS OF MAKING PATTERNED STRUCTURES OF MATERIALS, PATTERNED STRUCTURES OF MATERIALS, AND METHODS OF USING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/129162    International Application No.:    PCT/US2012/029653
Publication Date: 27.09.2012 International Filing Date: 19.03.2012
IPC:
G03F 7/00 (2006.01), G03F 7/16 (2006.01), H01L 21/027 (2006.01), H01L 51/50 (2006.01)
Applicants: CORNELL UNIVERSITY [US/US]; Cornell Center For Technology, Enterprise & Commercialization ("CCTEC") 395 Pine Tree Road Suite 310 Ithaca, NY 14850 (US) (For All Designated States Except US).
SCHWARTZ, Evan, L. [US/US]; (US) (For US Only).
CHAN, Wei, Min [MY/US]; (US) (For US Only).
LEE, Jin-Kyun [KR/US]; (KR) (For US Only).
TIWARI, Sandip [US/US]; (US) (For US Only).
OBER, Christopher, K. [US/US]; (US) (For US Only)
Inventors: SCHWARTZ, Evan, L.; (US).
CHAN, Wei, Min; (US).
LEE, Jin-Kyun; (KR).
TIWARI, Sandip; (US).
OBER, Christopher, K.; (US)
Agent: WATT, Rachel, S.; Hodgson Russ LLP The Guaranty Building 140 Pearl Street, Suite 100 Buffalo, NY 14202-4040 (US)
Priority Data:
61/454,015 18.03.2011 US
Title (EN) METHODS OF MAKING PATTERNED STRUCTURES OF MATERIALS, PATTERNED STRUCTURES OF MATERIALS, AND METHODS OF USING SAME
(FR) PROCÉDÉS DE FABRICATION DE STRUCTURES DE MATÉRIAUX À MOTIF, STRUCTURES DE MATÉRIAU À MOTIF ET DES PROCÉDÉS POUR LES UTILISER
Abstract: front page image
(EN)A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.
(FR)L'invention concerne un procédé pour former des motifs de matériaux de polymères organiques. Le procédé peut être utilisé pour former une couche avec deux matériaux de polymères organiques à motif. La résine photosensible et les solvants utilisés dans les étapes de dépôt et de retrait de la résine photosensible n'affectent pas sensiblement les matériaux de polymères organiques.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)