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1. (WO2012128467) APPARATUS AND METHOD FOR MANUFACTURING A CYLINDRICAL STAMP USING A CYLINDRICAL PATTERN MASK
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/128467    International Application No.:    PCT/KR2012/000752
Publication Date: 27.09.2012 International Filing Date: 31.01.2012
IPC:
H01L 21/027 (2006.01)
Applicants: NEW OPTICS LTD. [KR/KR]; 203 Guam-ri, Nam-myeon, Yangju-si Gyeonggi-do 482-872 (KR) (For All Designated States Except US).
CHAE, JooHyun [KR/KR]; (KR) (For US Only).
YOU, JiKang [KR/KR]; (KR) (For US Only).
HUR, JiWon [KR/KR]; (KR) (For US Only).
LEE, KyuMan [KR/KR]; (KR) (For US Only)
Inventors: CHAE, JooHyun; (KR).
YOU, JiKang; (KR).
HUR, JiWon; (KR).
LEE, KyuMan; (KR)
Agent: LEE, Jae-Chan; Qus International Patent Office 2nd Fl., Jeonghwan Bldg. 263-2 Yangjae-dong, Seocho-gu Seoul 137-894 (KR)
Priority Data:
10-2011-0024391 18.03.2011 KR
Title (EN) APPARATUS AND METHOD FOR MANUFACTURING A CYLINDRICAL STAMP USING A CYLINDRICAL PATTERN MASK
(FR) APPAREIL ET PROCÉDÉ PERMETTANT DE FABRIQUER UN POINÇON CYLINDRIQUE À L'AIDE D'UN MASQUE DE MOTIF CYLINDRIQUE
(KO) 원통형 패턴 마스크를 이용한 원통형 스탬프 제작 장치 및 제작 방법
Abstract: front page image
(EN)The present invention relates to an apparatus and method for manufacturing a cylindrical stamp using a cylindrical pattern mask, and more particularly, to an apparatus and method for manufacturing a cylindrical stamp using a cylindrical pattern mask, wherein at least one semi-cylindrical pattern mask is coupled to a cylindrical mold plated with Ni-P for UV exposure, to thereby manufacture various patterns having a size of several micrometers through a continuous automated process. The apparatus for manufacturing a cylindrical stamp using the cylindrical pattern mask includes: a cylindrical mold on which preprocessing for UV exposure is performed; a transfer device for transferring the cylindrical mold; at least one pattern mask for forming patterns on the cylindrical mold; and a UV light source for performing UV exposure.
(FR)La présente invention a trait à un appareil et à un procédé permettant de fabriquer un poinçon cylindrique à l'aide d'un masque de motif cylindrique et, plus particulièrement, à un appareil et à un procédé permettant de fabriquer un poinçon cylindrique à l'aide d'un masque de motif cylindrique, où au moins un masque de motif semi-cylindrique est couplé à un moule cylindrique plaqué avec Ni-P pour l'exposition aux UV, pour fabriquer de la sorte divers motifs dotés d'une taille de plusieurs micromètres au moyen d'un processus automatisé continu. L'appareil permettant de fabriquer un poinçon cylindrique à l'aide du masque de motif cylindrique inclut : un moule cylindrique sur lequel un prétraitement pour l'exposition aux UV est effectué; un dispositif de transfert permettant de transférer le moule cylindrique; au moins un masque de motif permettant de former des motifs sur le moule cylindrique; et une source de rayonnement ultraviolet permettant de procéder à une exposition aux UV.
(KO)본 발명은 원통형 패턴 마스크를 이용한 원통형 스탬프 제작 장치 및 원통형 스탬프 제작 방법에 관한 것으로, Ni-P를 도금한 원통형 금형에 하나 이상의 반원통형 패턴 마스크를 결합하여 UV 노광을 수행함에 수 마이크로미터 급의 다양한 패턴을 연속적인 자동화 공정을 통해 제작할 수 있는 원통형 패턴 마스크를 이용한 원통형 스탬프 제작 장치 및 원통형 스탬프 제작 방법에 관한 것이다. 본 발명의 원통형 패턴 마스크를 이용한 원통형 스탬프 제작 장치는 UV 노광을 위해 전처리가 수행되는 원통형 금형과 상기 원통형 금형을 이동하기 위한 이송 장치와 상기 원통형 금형에 패턴을 형성하기 위한 하나 이상의 패턴 마스크 및 상기 UV 노광을 실시하기 위한 UV 광원을 포함함에 기술적 특징이 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)