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1. (WO2012127883) SINTERED MATERIAL, AND PROCESS FOR PRODUCING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2012/127883 International Application No.: PCT/JP2012/002061
Publication Date: 27.09.2012 International Filing Date: 26.03.2012
IPC:
C23C 14/34 (2006.01) ,C04B 35/00 (2006.01) ,H01L 21/363 (2006.01)
Applicants: TOMAI, Shigekazu[JP/JP]; JP (UsOnly)
MATSUZAKI, Shigeo[JP/JP]; JP (UsOnly)
YANO, Koki[JP/JP]; JP (UsOnly)
ANDO, Makoto[JP/JP]; JP (UsOnly)
EBATA, Kazuaki[JP/JP]; JP (UsOnly)
ITOSE, Masayuki[JP/JP]; JP (UsOnly)
IDEMITSU KOSAN CO.,LTD.[JP/JP]; 1-1, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008321, JP (AllExceptUS)
Inventors: TOMAI, Shigekazu; JP
MATSUZAKI, Shigeo; JP
YANO, Koki; JP
ANDO, Makoto; JP
EBATA, Kazuaki; JP
ITOSE, Masayuki; JP
Agent: WATANABE, Kihei; Shibashin Kanda Bldg. 3rd Floor, 26, Kanda Suda-cho 1-chome, Chiyoda-ku, Tokyo 1010041, JP
Priority Data:
2011-06529124.03.2011JP
Title (EN) SINTERED MATERIAL, AND PROCESS FOR PRODUCING SAME
(FR) MATÉRIAU FRITTÉ ET SON PROCÉDÉ DE FABRICATION
(JA) 焼結体及びその製造方法
Abstract: front page image
(EN) A sintered material comprising at least indium oxide and gallium oxide, wherein voids each having a volume of 14000 μm3 or more are contained in an amount of 0.03 vol% or less.
(FR) L'invention concerne un matériau fritté comprenant au moins de l'oxyde d'indium et de l'oxyde de gallium, dans lequel des vides ayant chacun un volume de 14 000 µm3 ou plus sont contenus dans une quantité de 0,03 % en volume ou moins.
(JA) 少なくとも酸化インジウム及び酸化ガリウムを含有する焼結体であって、体積14000μm以上の空隙が0.03体積%以下である焼結体。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)