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1. (WO2012127398) A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLYMERIC POLYAMINE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/127398    International Application No.:    PCT/IB2012/051292
Publication Date: 27.09.2012 International Filing Date: 19.03.2012
IPC:
C09G 1/02 (2006.01)
Applicants: BASF SE [DE/DE]; 67056 Ludwigshafen (DE) (For All Designated States Except US).
NOLLER, Bastian Marten [DE/DE]; (DE) (For US Only).
FRANZ, Diana [DE/DE]; (DE) (For US Only).
RUSHING, Kenneth [US/US]; (US) (For US Only).
LAUTER, Michael [DE/DE]; (DE) (For US Only).
SHEN, Daniel Kwo-Hung; (TW) (For US Only).
LAN, Yongqing [CN/US]; (US) (For US Only).
BAO, Zhenyu [CN/US]; (US) (For US Only).
BASF (CHINA) COMPANY LIMITED [CN/CN]; 300 Jiangxinsha Road Shanghai, 200137 (CN) (MN only).
GAO, Ning [--/US]; (US) (For US Only)
Inventors: NOLLER, Bastian Marten; (DE).
FRANZ, Diana; (DE).
RUSHING, Kenneth; (US).
LAUTER, Michael; (DE).
SHEN, Daniel Kwo-Hung; (TW).
LAN, Yongqing; (US).
BAO, Zhenyu; (US).
LI, Yuzhuo; (DE)
Common
Representative:
BASF SE; 67056 Ludwigshafen (DE)
Priority Data:
61/466,009 22.03.2011 US
Title (EN) A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLYMERIC POLYAMINE
(FR) COMPOSITION DE POLISSAGE CHIMIQUE-MÉCANIQUE (CMP) COMPRENANT UNE POLYAMINE POLYMÈRE
Abstract: front page image
(EN)A chemical-mechanical polishing (CMP) composition comprising (A) inorganic particles, organic particles, or a composite or mixture thereof, (B) a polymeric polyamine or a salt thereof comprising at least one type of pendant group (Y) which comprises at least one moiety (Z), wherein (Z) is a carboxylate (-COOR1), sulfonate (-SO3R2), sulfate (-O-SO3R3), phos- phonate (-P(=O)(OR4)(OR5) ), phosphate (-O-P(=O)(OR6)(OR7) ), carboxylic acid (-COOH), sulfonic acid (-SO3H), sulfuric acid (-O-SO3-), phosphonic acid (-P(=O)(OH)2), phosphoric acid (-O-P(=O)(OH)2) moiety, or their deproto- nated forms, R1 is alkyl, aryl, alkylaryl, or arylalkyl R2 is alkyl, aryl, alkylaryl, or arylalkyl, R3 is alkyl, aryl, alkylaryl, or arylalkyl, R4 is alkyl, aryl, alkylaryl, or arylalkyl, R5 is H, alkyl, aryl, alkylaryl, or arylalkyl, R6 is alkyl, aryl, alkylaryl, or arylalkyl, R7 is H, alkyl, aryl, alkylaryl, or arylalkyl, and (C) an aqueous medium.
(FR)La présente invention concerne une composition de polissage chimique-mécanique (CMP) comprenant (A) des particules inorganiques, des particules organiques, ou un composite ou mélange de celles-ci, (B) une polyamine polymère ou un sel de celle-ci comprenant au moins un type de groupe pendant (Y) qui comprend au moins un fragment (Z), (Z) étant un fragment carboxylate (-COOR1), sulfonate (-SO3R2), sulfate (-O-SO3R3), phosphonate (-P(=O)(OR4)(OR5)), phosphate (-O-P(=O)(OR6)(OR7)), acide carboxylique (-COOH), acide sulfonique (-SO3H), acide sulfurique (-O-SO3-), acide phosphonique (-P(=O)(OH)2), acide phosphorique (-O-P(=O)(OH)2), ou leurs formes déprotonées, R1 est alkyle, aryle, alkylaryle, ou arylalkyle, R2 est alkyle, aryle, alkylaryle, ou arylalkyle, R3 est alkyle, aryle, alkylaryle, ou arylalkyle, R4 est alkyle, aryle, alkylaryle, ou arylalkyle, R5 est H, alkyle, aryle, alkylaryle, ou arylalkyle, R6 est alkyle, aryle, alkylaryle, ou arylalkyle, R7 est H, alkyle, aryle, alkylaryle, ou arylalkyle, et (C) un milieu aqueux.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)