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1. (WO2012125503) MICROELECTROMECHANICAL SYSTEM DEVICE INCLUDING A METAL PROOF MASS AND A PIEZOELECTRIC COMPONENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/125503    International Application No.:    PCT/US2012/028624
Publication Date: 20.09.2012 International Filing Date: 09.03.2012
Chapter 2 Demand Filed:    14.12.2012    
IPC:
H01L 41/08 (2006.01), H01L 41/113 (2006.01), B81B 3/00 (2006.01), G01C 19/56 (2012.01)
Applicants: QUALCOMM MEMS TECHNOLOGIES, INC., [US/US]; 5775 Morehouse Drive San Diego, California 92121-1714 (US) (For All Designated States Except US).
BLACK, Justin, Phelps [US/US]; (US) (For US Only).
GANAPATHI, Srinivasan, Kodaganallur [US/US]; (US) (For US Only).
STEPHANOU, Philip, Jason [US/US]; (US) (For US Only).
PETERSEN, Kurt, Edward [US/US]; (US) (For US Only).
ACAR, Cenk [TR/US]; (US) (For US Only).
SHENOY, Ravindra, Vaman [US/US]; (US) (For US Only).
BUCHAN, Nicholas, Ian [US/US]; (US) (For US Only)
Inventors: BLACK, Justin, Phelps; (US).
GANAPATHI, Srinivasan, Kodaganallur; (US).
STEPHANOU, Philip, Jason; (US).
PETERSEN, Kurt, Edward; (US).
ACAR, Cenk; (US).
SHENOY, Ravindra, Vaman; (US).
BUCHAN, Nicholas, Ian; (US)
Agent: GLADE, Stephen, C.; Weaver Austin Villeneuve & Sampson LLP P.O. Box 70250 Oakland, California 94612-0250 (US)
Priority Data:
13/048,798 15.03.2011 US
Title (EN) MICROELECTROMECHANICAL SYSTEM DEVICE INCLUDING A METAL PROOF MASS AND A PIEZOELECTRIC COMPONENT
(FR) DISPOSITIF DE SYSTÈME MICRO-ÉLECTROMÉCANIQUE COMPRENANT UNE MASSE ÉTALON EN MÉTAL ET UN COMPOSANT PIÉZOÉLECTRIQUE
Abstract: front page image
(EN)This disclosure provides systems, apparatus, and devices and methods of fabrication for electromechanical devices. In one implementation, an apparatus includes a metal proof mass and a piezoelectric component as part of a MEMS device. Such apparatus can be particularly useful for MEMS gyroscope devices. For instance, the metal proof mass, which may have a density several times larger than that of silicon, is capable of reducing the quadrature and bias error in a MEMS gyroscope device, and capable of increasing the sensitivity of the MEMS gyroscope device.
(FR)L'invention concerne des systèmes, des appareils et des dispositifs ainsi que des procédés de fabrication de dispositifs électromécaniques. Dans un mode de réalisation, un appareil comprend une masse étalon en métal et un composant piézoélectrique faisant partie d'un dispositif MEMS. Ledit appareil peut être particulièrement utile pour des dispositifs à gyroscope MEMS. La masse étalon en métal, par exemple, qui peut posséder une densité plusieurs fois supérieure à celle du silicium, est capable de réduire les erreurs de quadrature et de polarisation dans un dispositif à gyroscope MEMS et capable d'accroître la sensibilité du dispositif à gyroscope MEMS.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)