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1. (WO2012125401) NOVEL ETCHING COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2012/125401 International Application No.: PCT/US2012/028249
Publication Date: 20.09.2012 International Filing Date: 08.03.2012
IPC:
C09K 13/00 (2006.01)
Applicants: TAKAHASHI, Tomonori[JP/US]; US (UsOnly)
INABA, Tadashi[JP/JP]; JP (UsOnly)
MIZUTANI, Atsushi[JP/JP]; JP (UsOnly)
DU, Bing[CN/US]; US (UsOnly)
WOJTCZAK, William A.[US/US]; US (UsOnly)
TAKAHASHI, Kazutaka[JP/JP]; JP (UsOnly)
KAMIMURA, Tetsuya[JP/JP]; JP (UsOnly)
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.[US/US]; 80 Circuit Drive North Kingstown, Rhode Island 02852, US (AllExceptUS)
FUJIFILM CORPORATION[JP/JP]; 26-30, Nishiazabu 2-chome Minato-ku, Tokyo 1060031, JP (AllExceptUS)
Inventors: TAKAHASHI, Tomonori; US
INABA, Tadashi; JP
MIZUTANI, Atsushi; JP
DU, Bing; US
WOJTCZAK, William A.; US
TAKAHASHI, Kazutaka; JP
KAMIMURA, Tetsuya; JP
Agent: WEFERS, Marc M.; Fish & Richardson P.C. P.O. Box 1022 Minneapolis, Minnesota 55440-1022, US
Priority Data:
61/451,91011.03.2011US
61/540,85029.09.2011US
Title (EN) NOVEL ETCHING COMPOSITION
(FR) NOUVELLE COMPOSITION DE GRAVURE
Abstract: front page image
(EN) This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.
(FR) Cette invention concerne une composition de gravure contenant au moins un acide sulfonique, au moins un composé contenant un anion halogénure, l'halogénure étant un chlorure ou un bromure, au moins un composé contenant un nitrate ou un ion nitrosyle, et de l'eau. Le ou les acides sulfoniques peuvent représenter environ 25 % en poids à environ 95 % en poids de la composition. L'anion halogénure peut être un chlorure ou un bromure, et peut représenter environ 0,01 % en poids à environ 0,5 % en poids de la composition. Le nitrate ou l'ion nitrosyle peut représenter environ 0,1 % en poids à environ 20 % en poids de la composition. L'eau peut représenter au moins environ 3 % en poids de la composition.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)