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1. (WO2012124593) VAPOR DEPOSITION PARTICLE PROJECTION DEVICE AND VAPOR DEPOSITION DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2012/124593 International Application No.: PCT/JP2012/055941
Publication Date: 20.09.2012 International Filing Date: 08.03.2012
IPC:
C23C 14/24 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/10 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Applicants: SONODA, Tohru; null (UsOnly)
KAWATO, Shinichi; null (UsOnly)
INOUE, Satoshi; null (UsOnly)
HASHIMOTO, Satoshi; null (UsOnly)
SHARP KABUSHIKI KAISHA[JP/JP]; 22-22, Nagaike-cho, Abeno-ku, Osaka-shi, Osaka 5458522, JP (AllExceptUS)
Inventors: SONODA, Tohru; null
KAWATO, Shinichi; null
INOUE, Satoshi; null
HASHIMOTO, Satoshi; null
Agent: HARAKENZO WORLD PATENT & TRADEMARK; Daiwa Minamimorimachi Building, 2-6, Tenjinbashi 2-chome Kita, Kita-ku, Osaka-shi, Osaka 5300041, JP
Priority Data:
2011-05725815.03.2011JP
Title (EN) VAPOR DEPOSITION PARTICLE PROJECTION DEVICE AND VAPOR DEPOSITION DEVICE
(FR) DISPOSITIF DE PROJECTION DE PARTICULES DE DÉPÔT EN PHASE VAPEUR ET DISPOSITIF DE DÉPÔT EN PHASE VAPEUR
(JA) 蒸着粒子射出装置および蒸着装置
Abstract:
(EN) This vapor deposition particle projection device (501) is provided with a nozzle unit (170) that is connected to vapor deposition particle generation units (110, 120), which generate gaseous vapor deposition particles by heating vapor deposition materials (114, 124), and that has a projection opening (171) that outwardly projects vapor deposition particles generated by the vapor deposition particle generating units (110, 120). The amount of vapor deposition material housed by vapor deposition particle generation unit (120) is less than the amount of vapor deposition material housed by vapor deposition particle generation unit (110).
(FR) La présente invention se rapporte à un dispositif de projection de particules de dépôt en phase vapeur (501) qui est pourvu d'une unité de buse (170) qui est raccordée à des unités de génération de particules de dépôt en phase vapeur (110, 120) qui génèrent des particules gazeuses de dépôt en phase vapeur par chauffage de matériaux de dépôt en phase vapeur (114, 124) et qui présente une ouverture de projection (171) qui projette vers l'extérieur des particules de dépôt en phase vapeur générées par les unités de génération de particules de dépôt en phase vapeur (110, 120). La quantité de matériau de dépôt en phase vapeur reçue par l'unité de génération de particules de dépôt en phase vapeur (120) est inférieure à la quantité de matériau de dépôt en phase vapeur reçue par l'unité de génération de particules de dépôt en phase vapeur (110).
(JA)  本発明の蒸着粒子射出装置(501)は、蒸着材料(114),(124)を加熱して気体状の蒸着粒子を発生させる蒸着粒子発生部(110),(120)と接続され、上記蒸着粒子発生部(110),(120)で発生させた蒸着粒子を外部に射出する射出口(171)を有するノズル部(170)とを備える。上記蒸着粒子発生部(120)の蒸着材料収容量が、上記蒸着粒子発生部(110)の蒸着材料収容量よりも小さい。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)