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1. (WO2012121418) NANOIMPRINTING METHOD AND NANOIMPRINTING APPARATUS FOR EXECUTING THE METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/121418    International Application No.:    PCT/JP2012/056783
Publication Date: 13.09.2012 International Filing Date: 09.03.2012
IPC:
G03F 7/00 (2006.01)
Applicants: FUJIFILM CORPORATION [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 (JP) (For All Designated States Except US).
NAKAMURA, Kazuharu [JP/JP]; (JP) (For US Only).
WAKAMATSU, Satoshi [JP/JP]; (JP) (For US Only)
Inventors: NAKAMURA, Kazuharu; (JP).
WAKAMATSU, Satoshi; (JP)
Agent: YANAGIDA, Masashi; YANAGIDA & Associates, 7F, Shin-Yokohama KS Bldg., 3-18-3, Shin-Yokohama, Kohoku-ku, Yokohama-shi, Kanagawa 2220033 (JP)
Priority Data:
2011-051031 09.03.2011 JP
Title (EN) NANOIMPRINTING METHOD AND NANOIMPRINTING APPARATUS FOR EXECUTING THE METHOD
(FR) PROCÉDÉ DE NANOIMPRESSION ET DISPOSITIF DE NANOIMPRESSION POUR METTRE EN OEUVRE CE PROCÉDÉ
Abstract: front page image
(EN)[Objective] To realize pressing of a mold against a surface coated with curable resin at a uniform pressure to suppress the generation of fluctuations in residual film, in nanoimprinting that employs a mesa type mold and/or a mesa type substrate. [Constitution] In a nanoimprinting method, an assembly (8), of which the entire surface is directly exposable to the environment, is supported by a pressure vessel (110) by a support member (140) such that fluid pressure (P) from the environment operates on the entire surface of the assembly (8). Gas is introduced into the pressure vessel (110), and fluid pressure (P) exerted by the gas presses a mold (1) and a substrate (7) against each other.
(FR)L'invention vise à presser, à une pression uniforme, un moule contre une surface revêtue d'une résine durcissable de manière à supprimer la production de fluctuations dans un film résiduel, dans la mise en oeuvre d'une nanoimpression utilisant un moule du type mesa et/ou un substrat du type mesa. Dans le procédé de nanoimpression, un ensemble (8), dont la surface entière peut être exposée directement à l'environnement, est maintenu par un récipient de pression (110) et par un élément de support (140), de sorte que la pression du fluide (P) provenant de l'environnement agit sur la surface entière de l'ensemble (8). Un gaz est introduit dans le récipient de pression (110), et la pression de fluide (P) exercée par le gaz presse un moule (1) et un substrat (7) l'un contre l'autre.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)