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1. (WO2012116056) ION-ASSISTED PLASMA TREATMENT OF A THREE-DIMENSIONAL STRUCTURE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/116056    International Application No.:    PCT/US2012/026093
Publication Date: 30.08.2012 International Filing Date: 22.02.2012
IPC:
H01L 21/768 (2006.01), C23C 14/22 (2006.01)
Applicants: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. [US/US]; 35 Dory Road Gloucester, MA 01930 (US) (For All Designated States Except US).
STEEN, Louis [US/US]; (US) (For US Only).
GODET, Ludovic [FR/US]; (US) (For US Only).
MARTIN, Patrick, M. [US/US]; (US) (For US Only)
Inventors: STEEN, Louis; (US).
GODET, Ludovic; (US).
MARTIN, Patrick, M.; (US)
Agent: LUCEK, Nathaniel; Varian Semiconductor Equipment Associates, Inc. 35 Dory Road Gloucester, MA 01930 (US)
Priority Data:
61/445,174 22.02.2011 US
13/401,168 21.02.2012 US
Title (EN) ION-ASSISTED PLASMA TREATMENT OF A THREE-DIMENSIONAL STRUCTURE
(FR) TRAITEMENT PLASMA ASSISTÉ PAR IONS APPLIQUÉ À UNE STRUCTURE TRIDIMENSIONNELLE
Abstract: front page image
(EN)A boundary between a plasma and a plasma sheath is controlled such that; a potion of the shape, is not parallel to a plane defined by a front surface of the workpiece facing the plasma. Ions in the plasma are directed toward the workpiece, These Ions can either seal pores or clean a material from a structure on the workpiece. This structure may, for example, have multiple sidewalls, A process that both cleans a material and seals pores in the structure may he performed.
(FR)Selon la présente invention, une limite entre un plasma et une gaine de plasma est maîtrisée, de sorte qu'une partie de la forme ne soit pas parallèle à un plan défini par une surface antérieure de la pièce en regard du plasma. Des ions dans le plasma sont dirigés vers la pièce. Lesdits ions peuvent obturer hermétiquement les pores ou éliminer une matière d'une structure sur la pièce. Cette structure peut par exemple posséder plusieurs parois latérales. L'invention concerne aussi un procédé permettant d'éliminer la matière et d'obturer hermétiquement des pores dans la structure.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)