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1. (WO2012112894) FOCUSING A CHARGED PARTICLE IMAGING SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/112894    International Application No.:    PCT/US2012/025656
Publication Date: 23.08.2012 International Filing Date: 17.02.2012
IPC:
H01J 37/09 (2006.01), H01J 37/21 (2006.01), H01J 37/22 (2006.01), H01J 37/28 (2006.01)
Applicants: APPLIED MATERIALS ISRAEL, LTD. [IL/IL]; 9 Oppenheimer Street 76236 Rehovot (IL) (For All Designated States Except US).
APPLIED MATERIALS, INC. [US/US]; P.O. Box 450A Santa Clara, CA 95052 (US) (ZW only).
CARL ZEISS SMT GMBH [DE/DE]; Rudolf-Eber-Strasse 2 73447 Oberkochen (DE) (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IS, IT, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM only).
RODGERS, Steven R. [IL/IL]; (IL) (For US Only).
KNIPPELMEYER, Rainer K. [DE/DE]; (DE) (For US Only).
KEMEN, Thomas [DE/DE]; (DE) (For US Only).
SCHUBERT, Stefan [DE/DE]; (DE) (For US Only).
ELMALIAH, Nissim [IL/IL]; (IL) (For US Only)
Inventors: RODGERS, Steven R.; (IL).
KNIPPELMEYER, Rainer K.; (DE).
KEMEN, Thomas; (DE).
SCHUBERT, Stefan; (DE).
ELMALIAH, Nissim; (IL)
Agent: FAHMI, Tarek N.; SNR DENTON US LLP P.O. Box 061080 Wacker Drive Station, Willis Tower Chicago, IL 60606 (US)
Priority Data:
61/444,506 18.02.2011 US
Title (EN) FOCUSING A CHARGED PARTICLE IMAGING SYSTEM
(FR) FOCALISATION D'UN SYSTÈME D'IMAGERIE À PARTICULES CHARGÉES
Abstract: front page image
(EN)A charged particle beam focusing apparatus (200) includes a charged particle beam generator (202) configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations (217) on a surface of a specimen (39), thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector (31) configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor (32) analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.
(FR)L'invention concerne un appareil de focalisation de faisceau de particules chargées qui comprend un générateur de faisceau de particules chargées conçu pour projeter simultanément au moins un faisceau de particules chargées non astigmate et au moins un faisceau de particules chargées astigmate sur des sites sur une surface d'un échantillon, en provoquant ainsi l'émission des électrons libérés depuis les sites. L'appareil comprend également un détecteur d'imagerie conçu pour recevoir les électrons libérés depuis les sites et pour former des images des sites par les électrons libérés. Un processeur analyse l'image produite par le ou les faisceaux de particules chargées astigmates et en réponse à cette analyse, ajuste un point focal du ou des faisceaux de particules chargées non astigmate.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)