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Machine translation
1. (WO2012112342) METHOD AND APPARATUS FOR IMPROVED LASER SCRIBING OF OPTO-ELECTRIC DEVICES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/112342    International Application No.:    PCT/US2012/024181
Publication Date: 23.08.2012 International Filing Date: 07.02.2012
IPC:
H01L 21/301 (2006.01), H01L 33/00 (2010.01)
Applicants: ELECTRO SCIENTIFIC INDUSTRIES, INC.; 13900 NW Science Park Drive Portland, OR 97229 (US) (For All Designated States Except US).
CHACIN, Juan [VE/US]; (US) (For US Only).
CHYR, Irving [--/US]; (US) (For US Only).
HALDERMAN, Jonathan [US/US]; (US) (For US Only)
Inventors: CHACIN, Juan; (US).
CHYR, Irving; (US).
HALDERMAN, Jonathan; (US)
Agent: HAYNES, Mark, A.; Haynes Beffel & Wolfeld LLP P.O. Box 366 637 Main Street Half Moon Bay, CA 94019 (US)
Priority Data:
13/031,232 20.02.2011 US
Title (EN) METHOD AND APPARATUS FOR IMPROVED LASER SCRIBING OF OPTO-ELECTRIC DEVICES
(FR) PROCÉDÉ ET APPAREIL DE RAINURAGE LASER AMÉLIORÉ DE DISPOSITIFS OPTOÉLECTRIQUES
Abstract: front page image
(EN)Disclosed are laser scribing systems for laser scribing semiconductor substrates with backside coatings. In particular these laser scribing systems laser scribe opto-electric semiconductor wafers with reflective backside coatings so as to avoid damage to the opto-electric device while maintaining efficient manufacturing. In more particular these laser scribing systems employ ultrafast pu lsed lasers at wavelength in the visible region and below in multiple passes to remove the backside coatings and scribe the wafer.
(FR)L'invention concerne des systèmes de rainurage laser permettant de rainurer au laser des substrats semi-conducteurs avec des revêtements de face arrière. En particulier, ces systèmes de rainurage laser rainurent au laser des tranches de semi-conducteur optoélectriques avec des revêtements de face arrière réflecteurs de façon à éviter d'endommager le dispositif optoélectrique tout en conservant une fabrication rentable. Plus particulièrement, ces systèmes de rainurage laser emploient des lasers à impulsion ultrarapide à une longueur d'onde dans le domaine visible et en dessous en passages multiples afin de supprimer les revêtements de face arrière et de rainurer la tranche.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)