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Machine translation
1. (WO2012111964) SOLVENTLESS COMPOSITION AND METHOD FOR PREPARING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/111964    International Application No.:    PCT/KR2012/001112
Publication Date: 23.08.2012 International Filing Date: 14.02.2012
IPC:
C08F 20/10 (2006.01), C08F 20/18 (2006.01), C08L 33/04 (2006.01), C08J 5/18 (2006.01), C09J 7/02 (2006.01)
Applicants: LG CHEM, LTD. [KR/KR]; 128, Yeoui-daero, Yeongdeungpo-gu Seoul 150-721 (KR) (For All Designated States Except US).
JOO, Hyo Sook [KR/KR]; (KR) (For US Only).
SHIM, Jung Sup [KR/KR]; (KR) (For US Only).
KIM, Se Ra [KR/KR]; (KR) (For US Only).
CHANG, Suk Ky [KR/KR]; (KR) (For US Only)
Inventors: JOO, Hyo Sook; (KR).
SHIM, Jung Sup; (KR).
KIM, Se Ra; (KR).
CHANG, Suk Ky; (KR)
Agent: DANA PATENT LAW FIRM; 5th Floor BYC bldg., 8, Teheran-ro7-gil Gangnam-gu Seoul 135-080 (KR)
Priority Data:
10-2011-0012987 14.02.2011 KR
10-2012-0014764 14.02.2012 KR
Title (EN) SOLVENTLESS COMPOSITION AND METHOD FOR PREPARING SAME
(FR) COMPOSITION SANS SOLVANT ET PROCÉDÉ POUR PRÉPARER CELLE-CI
(KO) 무용제형 조성물 및 그의 제조방법
Abstract: front page image
(EN)The present invention relates to a solventless composition and a method for preparing the solventless composition. The present invention provides a solventless composition for effectively manufacturing a film displaying excellent processing efficiency during film manufacturing process and which is even, not having a substantial variation in the thickness thereof, a film that is even while having a thick thickness, or a film having excellent physical properties such as heat resistance. Also, the composition of the present invention does not cause pollution during the film manufacturing process. In addition, the present invention prevents gelation or phase separation of the ingredients of the composition, thereby providing a composition enabling manufacturing of a substrate film having excellent physical properties such as optical transparency, and displaying excellent heat resistance and dimensional stability.
(FR)La présente invention concerne une composition sans solvant et un procédé pour préparer la composition sans solvant. La présente invention concerne une composition sans solvant pour fabriquer efficacement un film présentant une excellente efficacité de traitement pendant le procédé de fabrication de film et qui est uniforme, n'ayant pas de variation substantielle de l'épaisseur de celui-ci, un film qui est uniforme tout en ayant une grosse épaisseur, ou un film ayant d'excellentes propriétés physiques telles que la résistance à la chaleur. De plus, la composition de la présente invention ne cause pas de pollution pendant le processus de fabrication de film. En outre, la présente invention empêche la gélification ou la séparation de phase des composants de la composition, de manière à produire une composition permettant la fabrication d'un film de substrat ayant d'excellentes propriétés physiques telles que la transparence optique, et présentant une résistance à la chaleur et une stabilité dimensionnelle excellentes.
(KO)본 발명은, 무용제형 조성물 및 그의 제조방법에 관한 것이다. 본 발명에서는, 필름 제조 과정에서 우수한 공정 효율을 나타내고, 두께의 편차가 실질적으로 존재하지 않는 균일한 필름, 두께가 두꺼우면서도 균일한 필름 또는 내열성 등의 물성이 우수한 필름을 효과적으로 제조할 수 있는 무용제형 조성물을 제공할 수 있다. 또한, 본 발명의 조성물은 필름 제조 과정에서 오염을 유발하지 않는다. 추가로, 본 발명에서는, 조성물의 성분들의 겔화 또는 상분리를 방지하여, 광학적 투명성 등의 물성이 탁월하고, 우수한 내열성 및 치수 안정성을 나타내는 기재 필름을 제조할 수 있는 조성물을 제공할 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)