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Machine translation
1. (WO2012111732) PLANT CULTIVATION DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/111732    International Application No.:    PCT/JP2012/053617
Publication Date: 23.08.2012 International Filing Date: 16.02.2012
IPC:
A01G 7/00 (2006.01), A01G 25/02 (2006.01)
Applicants: PANASONIC CORPORATION [JP/JP]; 1006, Oaza-Kadoma, Kadoma-shi, Osaka 5718501 (JP) (For All Designated States Except US).
MASUDA, Yukihiro; (For US Only).
MAEKAWA, Tetsuya; (For US Only)
Inventors: MASUDA, Yukihiro; .
MAEKAWA, Tetsuya;
Agent: ONDA, Hironori; 12-1, Ohmiya-cho 2-chome, Gifu-shi, Gifu 5008731 (JP)
Priority Data:
2011-030899 16.02.2011 JP
Title (EN) PLANT CULTIVATION DEVICE
(FR) DISPOSITIF DE CULTURE DE PLANTES
(JA) 植物育成装置
Abstract: front page image
(EN)A plant cultivation device (10) is provided with a mist generation unit (12) and a slide mechanism (11). The mist generation unit (12) generates radical-containing microparticles so that the amount of the radical delivered to the plant surface is at least 5×10-9g/cm2 per hour. The slide mechanism (11) alters the relative position between the microparticle spray position of the mist generation unit (12) and the plants (P).
(FR)La présente invention concerne un dispositif de culture de plantes (10) qui est pourvu d'un bloc de production de brouillard (12) et d'un mécanisme coulissant (11). Ledit bloc (12) produit des microparticules à teneur en radical, de manière que la quantité de radical distribuée à la surface de la plante soit au moins de 5 x 10-9g/cm2 par heure. Le mécanisme coulissant (11) modifie la position relative entre la pulvérisation de microparticules du bloc de production de brouillard (12) et les plantes (P).
(JA)植物育成装置(10)はミスト発生部(12)とスライド機構(11)を備える。ミスト発生部(12)は、植物表面に対する1時間あたりのラジカルの到達量が5×10-9g/cm以上となるようにラジカルを含む微粒子を発生させる。スライド機構(11)は、ミスト発生部(12)の微粒子噴射位置と植物(P)との相対位置を変更する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)