WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2012111459) GAP EMBEDDING COMPOSITION, METHOD OF EMBEDDING GAP AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/111459    International Application No.:    PCT/JP2012/052566
Publication Date: 23.08.2012 International Filing Date: 30.01.2012
IPC:
H01L 21/3065 (2006.01), G03F 7/40 (2006.01), H01L 21/027 (2006.01), H01L 21/312 (2006.01)
Applicants: FUJIFILM Corporation [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 (JP) (For All Designated States Except US).
YAMAMOTO, Keiji [JP/JP]; (JP) (For US Only)
Inventors: YAMAMOTO, Keiji; (JP)
Agent: IIDA, Toshizo; ISHII Bldg. 3F, 1-10, Shimbashi 3-chome, Minato-ku, Tokyo 1050004 (JP)
Priority Data:
2011-032121 17.02.2011 JP
Title (EN) GAP EMBEDDING COMPOSITION, METHOD OF EMBEDDING GAP AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE COMPOSITION
(FR) COMPOSITION D'ENROBAGE D'ENTREFER, PROCÉDÉ D'ENROBAGE D'ENTREFER ET PROCÉDÉ DE FABRICATION D'UN DISPOSITIF À SEMI-CONDUCTEURS À L'AIDE DE LA COMPOSITION
Abstract: front page image
(EN)A gap embedding composition used for embedding a patterned gap formed between photosensitive resin film portions on a semiconductor substrate surface, the gap embedding composition, at least having: a hydrolysis condensate of an aryloxysilane raw material; and an aromatic compound, as a solvent.
(FR)La présente invention se rapporte à une composition d'enrobage d'entrefer qui est utilisée pour enrober un entrefer à motifs formé entre des parties de film de résine photosensible sur une surface de substrat semi-conducteur, la composition d'enrobage d'entrefer comprenant au moins : un condensat d'hydrolyse d'une matière première à base d'aryloxysilane ; et un composé aromatique utilisé comme solvant.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)