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1. WO2012110914 - DEVICE FOR SYNTHESISING A NANOSTRUCTURED COMPOSITE MATERIAL, AND ASSOCIATED METHOD

Publication Number WO/2012/110914
Publication Date 23.08.2012
International Application No. PCT/IB2012/050549
International Filing Date 07.02.2012
IPC
C23C 14/22 2006.1
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
C23C 14/34 2006.1
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
CPC
C23C 14/22
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
C23C 14/228
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
228Gas flow assisted PVD deposition
H01J 37/301
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
301Arrangements enabling beams to pass between regions of different pressure
H01J 37/317
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
H01J 37/3178
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
3178for applying thin layers on objects
Applicants
  • COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES [FR]/[FR]
Inventors
  • LECONTE, Yann
  • PAQUEZ, Xavier
  • SUBLEMONTIER, Olivier
Agents
  • REBOUSSIN, Yohann
Priority Data
110044714.02.2011FR
Publication Language French (fr)
Filing Language French (FR)
Designated States
Title
(EN) DEVICE FOR SYNTHESISING A NANOSTRUCTURED COMPOSITE MATERIAL, AND ASSOCIATED METHOD
(FR) DISPOSITIF DE SYNTHESE D'UN MATERIAU COMPOSITE NANOSTRUCTURE ET PROCEDE ASSOCIE.
Abstract
(EN) The present invention relates to a device for synthesising a nanostructured composite material and to an associated method. The device includes a chamber (3) for synthesising said material, comprising a system (13) for depositing the matrix onto a target surface (15), a system (1, 4, 5, 9) for generating a supersonic jet of nanoparticles in a carrier gas, said system comprising an expansion chamber (1) and a buffer chamber (2) arranged between said system (1, 4, 5, 9) for generating said supersonic jet and the synthesis chamber (3), the prevailing pressure inside the buffer chamber (2) being lower than the prevailing pressure inside the expansion chamber (1), said supersonic jet of carrier gas driving the nanoparticles which are to thereby pass through the expansion chamber (1) and then through the buffer chamber (2), such that the nanoparticles pass through the synthesis chamber (3) onto the target surface (15).
(FR) La présente invention concerne un dispositif de synthèse d'un matériau composite nanostructuré et un procédé associé. Le dispositif comprend une chambre de synthèse (3) dudit matériau comportant un système (13) de dépôt de la matrice sur une surface cible (15), un système (1, 4, 5, 9) pour générer un jet supersonique de nanoparticules dans un gaz porteur, ledit système comportant une chambre de détente (1 ) et une chambre tampon (2) disposée entre ledit système (1, 4, 5, 9) pour générer ce jet supersonique et la chambre de synthèse (3), la pression régnant dans la chambre tampon (2) étant inférieure à la pression régnant dans la chambre de détente (1 ), ledit jet supersonique de gaz porteur entraînant les nanoparticules étant ainsi destiné à traverser la chambre de détente (1 ) puis la chambre tampon (2), de sorte que les nanoparticules traversent la chambre de synthèse (3) jusqu'à la surface cible (15).
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