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Machine translation
1. (WO2012108712) SEMICONDUCTOR WAFER CLEANING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/108712    International Application No.:    PCT/KR2012/000993
Publication Date: 16.08.2012 International Filing Date: 10.02.2012
IPC:
H01L 21/302 (2006.01)
Applicants: JEONG, In Kwon [KR/US]; (US)
Inventors: JEONG, In Kwon; (US)
Priority Data:
61/463,025 10.02.2011 US
61/463,305 15.02.2011 US
61/463,978 25.02.2011 US
10-2012-0013549 10.02.2012 KR
Title (EN) SEMICONDUCTOR WAFER CLEANING APPARATUS
(FR) APPAREIL DE NETTOYAGE DE PLAQUETTE SEMICONDUCTRICE
(KO) 반도체 기판 세정 장치
Abstract: front page image
(EN)Provided is a cleaning apparatus for cleaning a polished semiconductor wafer. Said cleaning apparatus comprises: wafer input units which are arranged in a line along a straight track; a wafer cleaning unit which includes first and second cleaning chambers configured to clean wafers; and a wafer drying unit which includes two or more drying chambers configured to dry the wafers. Said cleaning apparatus using at least one wafer gripping apparatus coupled with said straight track is configured to: separately deliver wafers to the first and second cleaning chambers of said wafer cleaning unit from said wafer input units to be cleaned; and separately deliver the cleaned wafers to the two or more drying chambers of said wafer drying unit from said first and second cleaning chambers of said wafer cleaning unit to be dried. The cleaning apparatus provided by the present invention provides high productivity and effective utilization of space. Further, the cleaning apparatus of the present invention also provides easy accessibility to a polishing device for maintenance.
(FR)La présente invention concerne un appareil de nettoyage conçu pour nettoyer une plaquette semiconductrice polie. Ledit appareil de nettoyage comprend : des unités d'entrée de plaquette qui sont placées sur une ligne le long d'une piste droite; une unité de nettoyage de plaquette qui comprend des premières et secondes chambres de nettoyage conçues pour nettoyer des plaquettes; ainsi qu'une unité de séchage de plaquette qui comprend au moins deux chambres de séchage conçues pour sécher les plaquettes. Ledit appareil de nettoyage utilise au moins un appareil de préhension de plaquette qui est couplé à la piste droite et est conçu pour : transporter de manière séparée les plaquettes jusqu'aux premières et secondes chambres de nettoyage de l'unité de nettoyage de plaquette, à partir des unités d'entrée de plaquette à nettoyer; puis transporter séparément les plaquettes nettoyées jusqu'aux au moins deux chambres de séchage de l'unité de séchage de plaquette, à partir desdites premières et secondes chambres de nettoyage de l'unité de nettoyage de plaquette à sécher. L'appareil de nettoyage permet d'obtenir une grande productivité et une exploitation efficace de l'espace. De plus, l'appareil de nettoyage selon l'invention est facilement accessible à un dispositif de polissage pour l'entretien.
(KO)연마된 반도체 기판을 세정하기 위한 세정 장치가 제공된다. 상기 세정 장치는 직선 트랙을 따라서 일렬로 배치되는 기판 입력부, 기판을 세정하도록 구성되는 제1 및 제2 세정 챔버를 포함하는 기판 세정부, 기판을 건조하도록 구성되는 2개 이상의 건조 챔버를 포함하는 기판 건조부를 포함한다. 상기 세정 장치는 상기 직선 트랙에 체결되는 적어도 하나의 기판 그리핑 장치를 이용하여 기판을 상기 기판 입력부로부터 상기 기판 세정부의 제1 및 제2 세정 챔버로 나누어 보내어 세정하며, 세정된 기판을 상기 기판 세정부의 상기 제1 및 제2 세정 챔버로부터 상기 기판 건조부의 2개 이상의 건조 챔버로 나누어 보내어 건조하도록 구성된다. 본 발명에서 제공하는 세정 장치는 높은 생산성 및 효율적인 공간 활용성을 제공한다. 또한, 본 발명의 세정 장치는 유지 관리를 위한 연마 장치로의 접근 용이성도 제공할 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)