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Pub. No.:    WO/2012/108465    International Application No.:    PCT/JP2012/052863
Publication Date: 16.08.2012 International Filing Date: 08.02.2012
G01N 23/225 (2006.01), G01N 1/28 (2006.01), G01N 33/44 (2006.01)
Applicants: BRIDGESTONE CORPORATION [JP/JP]; 10-1,Kyobashi 1-chome, Chuo-ku, Tokyo 1048340 (JP) (For All Designated States Except US).
NAKAMURA Satoshi [JP/JP]; (JP) (For US Only).
KUROTANI Yuji [JP/JP]; (JP) (For US Only).
TANABE Tatsuro [JP/JP]; (JP) (For US Only).
IGARASHI Takaaki [JP/JP]; (JP) (For US Only)
Inventors: NAKAMURA Satoshi; (JP).
TANABE Tatsuro; (JP).
IGARASHI Takaaki; (JP)
Agent: HONDA Ichiro; HONDA INTERNATIONAL PATENT & TRADEMARK OFFICE, 6th Floor, Yusei Fukushi Kotohira Bldg., 14-1, Toranomon 1-chome, Minato-ku, Tokyo 1050001 (JP)
Priority Data:
2011-024962 08.02.2011 JP
(JA) 高分子材料の評価方法
Abstract: front page image
(EN)Provided is a method for evaluating a polymer material whereby the dispersion state of a filler in the polymer material can be quickly and quantitatively evaluated. A method for evaluating a polymer material, said polymer material comprising a polymer compound and a filler and having a smooth surface at least as the top surface thereof. By use of a focused ion beam (FIB) (10), the polymer material (1) is cut along a direction at an angle (α) of 1-60o relative to the surface of the polymer material. Then, an image of the smooth surface (1A) of the polymer material, said smooth surface (1A) having been formed by the cutting, is taken from a direction perpendicular to the smooth surface.
(FR)Cette invention concerne un procédé d'évaluation rapide et quantitatif de l'état de dispersion d'une charge dans un matériau polymère. Le matériau polymère comprend un composé polymère et une charge, la surface supérieure au moins du matériau étant lisse. Le matériau polymère (1) est découpé par un faisceau ionique focalisé (10) dans un sens et selon un angle (α) de 1 à 60° formé par rapport à la surface du matériau. Un cliché de la surface lisse (1A) du matériau polymère, ladite surface lisse (1A) étant obtenue par ladite étape de découpe, est pris dans un sens perpendiculaire à la surface lisse.
(JA) 高分子材料中のフィラーの分散状態を、迅速かつ定量的に評価することが可能な高分子材料の評価方法を提供する。 高分子化合物とフィラーとを含む高分子材料であって、少なくとも上面が平坦な表面である高分子材料の評価方法である。高分子材料1を、集光イオンビーム(FIB)10を用いて、高分子材料の表面に対する角度αが1~60°をなす方向に切削した後、切削により形成された高分子材料の平滑面1Aを、平滑面に対し垂直な方向から撮影する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)