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Machine translation
1. (WO2012106386) POLYMERIC FILM ASSEMBLIES WITH IMPROVED RESISTANCE TO SMUDGES, RELATED ARTICLES AND METHODS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/106386    International Application No.:    PCT/US2012/023415
Publication Date: 09.08.2012 International Filing Date: 01.02.2012
IPC:
B32B 27/00 (2006.01)
Applicants: ENTROTECH, INC. [US/US]; 1245 Kinnear Road Columbus, OH 43212 (US) (For All Designated States Except US).
MCGUIRE, James, E., Jr. [US/US]; (US) (For US Only)
Inventors: MCGUIRE, James, E., Jr.; (US)
Agent: GRIFFITH, Lisa, M.; The Griffith Law Firm, A.P.C. 991C Lomas Santa Fe Drive, Suite 450 Solana Beach, CA 92075 (US)
Priority Data:
61/439,126 03.02.2011 US
Title (EN) POLYMERIC FILM ASSEMBLIES WITH IMPROVED RESISTANCE TO SMUDGES, RELATED ARTICLES AND METHODS
(FR) ENSEMBLES FILM POLYMÈRE AYANT UNE RÉSISTANCE AMÉLIORÉE AUX TRACES, ARTICLES ET PROCÉDÉS ASSOCIÉS
Abstract: front page image
(EN)A polymeric film assembly for application to at least one surface of an article comprises a polymeric film comprising an exterior surface, wherein the polymeric film comprises at least one clay in an anti-smudge effective amount, and wherein the polymeric film is essentially free of low surface energy components. A method for application of a polymeric film to at least one surface of an electronic device is also disclosed.
(FR)L'ensemble film polymère ci-décrit destiné à être appliqué sur au moins une surface d'un article comprend un film polymère comprenant une surface extérieure, ledit film polymère comprenant au moins une argile en une quantité anti-traces efficace, et étant sensiblement dépourvu de composants à basse énergie de surface. Un procédé d'application dudit film polymère sur au moins une surface d'un dispositif électronique est également décrit.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)