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Machine translation
1. (WO2012103933) METHOD AND APPARATUS FOR CORRECTING ERRORS IN AN EUV LITHOGRAPHY SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/103933    International Application No.:    PCT/EP2011/051374
Publication Date: 09.08.2012 International Filing Date: 01.02.2011
IPC:
B23K 26/00 (2006.01), G03F 7/20 (2006.01), G03F 1/00 (2012.01)
Applicants: CARL ZEISS SMT GMBH [DE/DE]; Rudolf-Eber-Str. 2 73447 Oberkochen (DE) (For All Designated States Except US).
PIXER TECHNOLOGY LTD. [IL/IL]; 44 Maale Camon 21613 Karmiel (IL) (For All Designated States Except US).
MENGEL, Markus [DE/DE]; (DE) (For US Only).
STICKEL, Franz-Josef [DE/DE]; (DE) (For US Only).
WEGMANN, Ulrich [DE/DE]; (DE) (For US Only).
DÖRBAND, Bernd [DE/DE]; (DE) (For US Only).
OSHEMKOV, Sergey [RU/IL]; (IL) (For US Only)
Inventors: MENGEL, Markus; (DE).
STICKEL, Franz-Josef; (DE).
WEGMANN, Ulrich; (DE).
DÖRBAND, Bernd; (DE).
OSHEMKOV, Sergey; (IL)
Agent: WEGNER, Hans; Bardehle Pagenberg Partnerschaft Patentanwälte Rechtsanwälte Prinzregentenplatz 7 81675 München (DE)
Priority Data:
Title (EN) METHOD AND APPARATUS FOR CORRECTING ERRORS IN AN EUV LITHOGRAPHY SYSTEM
(FR) PROCÉDÉ ET APPAREIL DE CORRECTION D'ERREURS DANS UN SYSTÈME DE LITHOGRAPHIE EUV
Abstract: front page image
(EN)The invention relates to a method for correcting a local surface defect (430, 440, 530, 540) of a reflective optical element (170, 171, 172, 173, 74, 175, 200, 300, 400, 500, 700, 800) of an extreme ultraviolet lithography system (100) comprises the steps of analyzing the local surface defect (430, 440, 530, 540), correcting the local surface defect (430, 440, 530, 540) by focusing femto- or picosecond light pulses of a laser system (600) onto positions of the local surface defect (430, 440, 530, 540), and verifying that a wave front sensor (190) associated with the extreme ultraviolet lithography system (100) can no longer detect the local surface defect (430, 440, 530, 540).
(FR)L'invention porte sur un procédé de correction d'un défaut de surface local (430, 440, 530, 540) d'un élément optique réflecteur (170, 171, 172, 173, 74, 175, 200, 300, 400, 500, 700, 800) d'un système de lithographie par ultraviolets extrêmes (EUV) (100) qui comprend les étapes consistant à analyser le défaut de surface local (430, 440, 530, 540), corriger le défaut de surface local (430, 440, 530, 540) par focalisation d'impulsions de lumière femto ou picoseconde d'un système laser (600) sur des positions du défaut de surface local (430, 440, 530, 540), et vérifier qu'un capteur de front d'onde (190) associé au système de lithographie par ultraviolets extrêmes (100) ne peut plus détecter le défaut de surface local (430, 440, 530, 540).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)