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Machine translation
1. (WO2012102481) METHOD FOR MANUFACTURING ANTI-REFLECTIVE COATING FOR SOLAR CELL HAVING MOTH-EYE STRUCTURE AND SOLAR CELL INCLUDING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/102481    International Application No.:    PCT/KR2011/009644
Publication Date: 02.08.2012 International Filing Date: 15.12.2011
IPC:
H01L 31/042 (2006.01), H01L 31/18 (2006.01)
Applicants: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY [KR/KR]; 134 Yonsei University, Sinchon-dong, Seodaemoon-gu, Seoul 120-749 (KR) (For All Designated States Except US).
MYOUNG, Jae Min [KR/KR]; (KR) (For US Only).
SHIN, Beom Ki [KR/KR]; (KR) (For US Only).
LEE, Tae Il [KR/KR]; (KR) (For US Only)
Inventors: MYOUNG, Jae Min; (KR).
SHIN, Beom Ki; (KR).
LEE, Tae Il; (KR)
Agent: LEE Chae-Hyung; Neo International Patent & Law Firm #501 Seongam B/D 115-22 Nonhyun 2dong, Kangnam-gu Seoul 135-733 (KR)
Priority Data:
10-2011-0007118 25.01.2011 KR
Title (EN) METHOD FOR MANUFACTURING ANTI-REFLECTIVE COATING FOR SOLAR CELL HAVING MOTH-EYE STRUCTURE AND SOLAR CELL INCLUDING SAME
(FR) PROCÉDÉ DE FORMATION D'UN REVÊTEMENT ANTI-RÉFLÉCHISSANT POUR CELLULES SOLAIRES AYANT UNE STRUCTURE D'ŒIL DE PAPILLON DE NUIT ET CELLULE SOLAIRE LE COMPORTANT
(KO) 나방눈 구조를 갖는 태양전지용 반사방지 코팅 제조 방법 및 그 코팅을 포함 하는 태양전지
Abstract: front page image
(EN)Provided is a method for forming an anti-reflective coating for a CIS-based solar cell including: a substrate; a lower electrode layer formed on the substrate; a photo-reacting layer which is formed on the lower electrode layer and is formed with CIS-based materials; a buffer layer formed on the photo-reacting layer; a ZnO layer which is formed on the buffer layer to perform a role of a window; and an upper electrode layer formed on the ZnO layer. The method for forming the anti-reflective coating for the CIS-based solar cell includes the steps of: vertically dipping the solar cell inside a reaction chamber containing a reactive compound which reacts with the upper electrode layer; sealing and heating the reaction chamber to cause a hydrothermal reaction; and forming the anti-reflective coating by growing a nano-rod of a moth-eye structure on the upper electrode layer in a bottom-up manner.
(FR)L'invention concerne un procédé de formation d'un revêtement anti-réfléchissant pour une cellule solaire à base de CIS comprenant : un substrat; une couche d'électrode inférieure formée sur le substrat; une couche photoréactive formée sur la couche d'électrode inférieure et constituée de matériau à base de CIS; une couche tampon formée sur la couche photoréactive; une couche de ZnO formée sur la couche tampon pour jouer le rôle de fenêtre; et une couche d'électrode supérieure formée sur la couche de ZnO. Le procédé de formation du revêtement anti-réfléchissant destiné à la cellule solaire à base de CIS comprend les étapes consistant à : plonger verticalement la cellule solaire à l'intérieur d'une chambre réactionnelle contenant un composé réactif réagissant avec la couche d'électrode supérieure; fermer hermétiquement et chauffer la chambre réactionnelle afin de provoquer une réaction hydrothermique; et former le revêtement anti-réfléchissant en faisant croître une nano-tige d'une structure d'œil de papillon de nuit sur la couche d'électrode supérieure en procédant du bas vers le haut.
(KO)본 발명에 따라서 기판과, 상기 기판 상에 형성된 하부 전극층과, 상기 하부 전극층 상에 형성된 CIS계 재료로 이루어진 광반웅층과, 상기 광반웅층 상에 형성된 버퍼층과, 상기 버퍼층 상에 형성되어 원도우 역할을 하는 ZnO 층과, 상기 ZnO 층상에 형성된 상부 전극층을 포함하는 CIS계 태양전지용 반사 방지 코팅을 형성하는 방법이 제공된다. 상기 방법은 상기 상부 전극층과 반웅하는 반웅 화합물을 담고 있는 반웅 챔버 내에 상기 태양전지를 수직 방향으로 침지시킨 후, 상기 반응 챔버를 밀봉하고 가열하여 하이드로써멀 반웅을 일으켜, 상기 상부 전극층 상에 바텀-업 (bottom-up) 방식으로 나방눈 구조의 나노로드를 성장시켜 반사 방지 코팅을 형성하는 단계를 포함하는 것을 특징으로 한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)