WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2012098822) CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/098822    International Application No.:    PCT/JP2011/080549
Publication Date: 26.07.2012 International Filing Date: 22.12.2011
IPC:
G03F 7/038 (2006.01), C08F 12/24 (2006.01), G03F 7/039 (2006.01)
Applicants: FUJIFILM Corporation [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1060031 (JP) (For All Designated States Except US).
TSUCHIMURA, Tomotaka; (For US Only).
YATSUO, Tadateru; (For US Only)
Inventors: TSUCHIMURA, Tomotaka; .
YATSUO, Tadateru;
Agent: TAKAMATSU, Takeshi; Koh-Ei Patent Firm, Toranomon East Bldg. 9F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003 (JP)
Priority Data:
2011-008331 18.01.2011 JP
61/504,431 05.07.2011 US
2011-255302 22.11.2011 JP
Title (EN) CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
(FR) COMPOSITION DE RÉSERVE À AMPLIFICATION CHIMIQUE, COUCHE DE RÉSERVE UTILISANT LA COMPOSITION, ÉBAUCHES DE MASQUE RECOUVERTES DE RÉSINE, PROCÉDÉ DE FORMATION DE MOTIF DE RÉSERVE, PHOTOMASQUE ET COMPOSÉ POLYMÈRE
Abstract: front page image
(EN)A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
(FR)L'invention porte sur une composition de réserve à amplification chimique contenant : (A) un composé polymère ayant une structure dans laquelle un atome d'hydrogène d'un groupe hydroxyle phénolique est remplacé par un groupe ayant une structure hydrocarbonée alicyclique polycyclique non décomposable en milieu acide ; et (B) un composé pouvant produire un acide lorsqu'il est exposé à un rayonnement ou des rayons actiniques.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)