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1. (WO2012096466) THIN FILM DEPOSITION APPARATUS AND SUBSTRATE TREATMENT SYSTEM INCLUDING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/096466    International Application No.:    PCT/KR2012/000039
Publication Date: 19.07.2012 International Filing Date: 03.01.2012
IPC:
H01L 21/683 (2006.01), H01L 21/687 (2006.01), H01L 21/205 (2006.01), C23C 16/458 (2006.01)
Applicants: WONIK IPS CO., LTD. [KR/KR]; 332-1, Cheongho-ri, Jinwi-myeon, Pyeongtaek-si Gyeonggi-do 451-862 (KR) (For All Designated States Except US).
LEE, Ho-Young [KR/KR]; (KR) (For US Only).
PARK, Sang-Joon [KR/KR]; (KR) (For US Only).
HEO, Jin-Pil [KR/KR]; (KR) (For US Only).
SON, Byung-Guk [KR/KR]; (KR) (For US Only).
JANG, Wook-Sang [KR/KR]; (KR) (For US Only).
LEE, Kyung-Cheol [KR/KR]; (KR) (For US Only)
Inventors: LEE, Ho-Young; (KR).
PARK, Sang-Joon; (KR).
HEO, Jin-Pil; (KR).
SON, Byung-Guk; (KR).
JANG, Wook-Sang; (KR).
LEE, Kyung-Cheol; (KR)
Agent: SINJI PATENT FIRM; BYC Bldg. 7Fl. 648-1 Yeoksam-dong, Gangnam-gu Seoul 135-080 (KR)
Priority Data:
10-2011-0004213 14.01.2011 KR
Title (EN) THIN FILM DEPOSITION APPARATUS AND SUBSTRATE TREATMENT SYSTEM INCLUDING SAME
(FR) APPAREIL DE DÉPÔT DE FILM MINCE ET SYSTÈME DE TRAITEMENT DE SUBSTRAT LE COMPRENANT
(KO) 박막 증착 장치 및 이를 포함한 기판 처리 시스템
Abstract: front page image
(EN)The present invention relates to a thin film deposition apparatus and a substrate treatment system including same. The thin film deposition apparatus includes a deposition chamber, a susceptor, a rotation mechanism, an elevation member, and an elevation driving unit. The deposition chamber has an inner space in which a deposition process is performed. The susceptor is disposed within the deposition chamber, and a plurality of substrates is seated on a top surface of the susceptor. The elevation member is disposed above the susceptor to support a portion of each side of the substrates seated on the susceptor. When the elevation member is operated, the substrates are separated from the susceptor or seated on the susceptor. The elevation driving unit elevates the elevation member.
(FR)La présente invention porte sur un appareil de dépôt de film mince et sur un système de traitement de substrat le comprenant. L'appareil de dépôt de film mince comprend une chambre de dépôt, un suscepteur, un mécanisme de rotation, un élément d'élévation et une unité d'entraînement d'élévation. La chambre de dépôt a un espace interne dans lequel un procédé de dépôt est réalisé. Le suscepteur est disposé à l'intérieur de la chambre de dépôt, et plusieurs substrats sont en appui sur une surface supérieure du suscepteur. L'élément d'élévation est disposé au-dessus du suscepteur pour supporter une partie de chaque côté des substrats en appui sur le suscepteur. Lorsque l'élément d'élévation est actionné, les substrats sont séparés du suscepteur ou en appui sur le suscepteur. L'unité d'entraînement d'élévation élève l'élément d'élévation.
(KO)박막 증착 장치는 증착 챔버와, 서셉터와, 회전기구와, 승강 부재, 및 승강 구동유닛을 포함한다. 증착 챔버는 증착 공정이 행해지는 내부 공간을 갖는다. 서셉터는 증착 챔버 내에 설치되며, 상면에 복수의 기판들이 안착된다. 회전기구는 서셉터를 회전 동작시킨다. 승강 부재는 서셉터 상부에 구비되어 서셉터 상에 안착된 기판들의 각 변부를 일부 지지하며, 승강 구동시 서셉터로부터 기판들을 분리시키거나 서셉터로 기판들을 안착시킨다. 승강 구동유닛은 승강 부재를 승강시킨다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)