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Machine translation
1. (WO2012091406) APPARATUS FOR PROCESSING EXHAUST FLUID
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/091406    International Application No.:    PCT/KR2011/010150
Publication Date: 05.07.2012 International Filing Date: 27.12.2011
IPC:
B01D 53/32 (2006.01), H05H 1/24 (2006.01), H01L 21/02 (2006.01)
Applicants: LOT VACUUM CO., LTD. [KR/KR]; 59-7, Singeonji-dong, Anseong-si, Gyeonggi-do 456-370 (KR) (For All Designated States Except US).
LEE, Sang-Yun [KR/KR]; (KR) (For US Only).
NOH, Myung Keun [KR/KR]; (KR) (For US Only).
OH, Heaungshig [KR/KR]; (KR) (For US Only)
Inventors: LEE, Sang-Yun; (KR).
NOH, Myung Keun; (KR).
OH, Heaungshig; (KR)
Agent: DANA PATENT LAW FIRM; 5th Floor, BYC Bldg., 648-1, Yeoksam-dong, Gangnam-gu, Seoul 135-080 (KR)
Priority Data:
10-2010-0135260 27.12.2010 KR
Title (EN) APPARATUS FOR PROCESSING EXHAUST FLUID
(FR) APPAREIL POUR LE TRAITEMENT DE FLUIDE D'ÉCHAPPEMENT
(KO) 배기 유체 처리 장치
Abstract: front page image
(EN)The present invention relates to an apparatus for processing exhaust fluid, which exhausts the fluid generated in the process chamber of an apparatus for manufacturing a display panel and a solar cell to the outside. The apparatus for processing exhaust fluid includes: a vacuum pump connected to the process chamber so as to create a vacuum inside the process chamber, wherein the vacuum pump exhausts the fluid generated in the process chamber to the outside; and a plasma reactor in which plasma is generated so as to create a decomposition reaction with the fluid generated in the process chamber. The plasma reactor includes: an insulation pipe disposed between the process chamber and the vacuum chamber to provide a space in which the decomposition reaction of the fluid occurs; at least one electrode part disposed on the outer surface of the pipe so as to receive power for generating the plasma; and a buffer part made of an electrically conductive elastic material, wherein the buffer part is disposed between the pipe and the electrode part so as to tightly attach the pipe to the electrode part.
(FR)La présente invention concerne un appareil pour le traitement de fluide d'échappement qui évacue vers l'extérieur le fluide généré dans la chambre de traitement d'un appareil destiné à la fabrication d'un panneau d'affichage et d'une cellule solaire. L'appareil pour le traitement de fluide d'échappement comprend : une pompe à vide raccordée à la chambre de traitement de façon à créer un vide à l'intérieur de la chambre de traitement, la pompe à vide évacuant vers l'extérieur le fluide généré dans la chambre de traitement ; et un réacteur plasma dans lequel le plasma est généré de façon à créer une réaction de décomposition avec le fluide généré dans la chambre de traitement. Le réacteur plasma comprend : un conduit d'isolation disposé entre la chambre de traitement et la chambre de vide pour former un espace dans lequel la réaction de décomposition du fluide intervient ; au moins une partie électrode disposée sur la surface externe du conduit de façon à recevoir de l'énergie pour générer le plasma ; et une partie tampon composée d'un matériau élastique électroconducteur, la partie tampon étant disposée entre le conduit et la partie électrode de façon à fixer solidement le conduit à la partie électrode.
(KO)본 발명은 반도체, 디스플레이 패널 및 태양광 전지 제조 장치의 공정 챔버에서 발생한 유체를 외부로 배기하는 배기 유체 처리 장치에 관한 것으로서, 상기 배기 유체 처리 장치는 상기 공정 챔버에 연결되어 상기 공정 챔버의 내부를 진공화하고, 상기 공정 챔버 내에서 발생한 유체를 외부로 배기하는 진공 펌프 및 플라즈마가 형성되어 상기 공정 챔버 내에서 발생한 유체의 분해 반응이 일어나는 플라즈마 반응기를 포함하며, 상기 플라즈마 반응기는 상기 공정 챔버와 상기 진공 펌프 사이에 마련되며, 상기 유체의 분해 반응이 일어나는 공간을 제공하는 절연성의 도관과, 상기 도관의 외주면에 마련되며, 플라즈마가 형성되도록 전압을 인가받는 적어도 하나 이상의 전극부와, 전기 전도성의 탄성체로 형성되고, 상기 도관 및 상기 전극부의 밀착시키도록 상기 내관과 상기 전극부 사이에 개재되는 완충부를 포함하여 구성된다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)