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Pub. No.:    WO/2012/090779    International Application No.:    PCT/JP2011/079458
Publication Date: 05.07.2012 International Filing Date: 20.12.2011
H01L 21/304 (2006.01), H01L 21/027 (2006.01)
Applicants: CENTRAL GLASS COMPANY, LIMITED [JP/JP]; 5253, Oaza Okiube, Ube-shi, Yamaguchi 7550001 (JP) (For All Designated States Except US).
KUMON, Soichi; (For US Only).
SAIO, Takashi; (For US Only).
ARATA, Shinobu; (For US Only).
SAITO, Masanori; (For US Only).
NANAI, Hidehisa; (For US Only).
AKAMATSU, Yoshinori; (For US Only)
Inventors: KUMON, Soichi; .
SAIO, Takashi; .
ARATA, Shinobu; .
SAITO, Masanori; .
NANAI, Hidehisa; .
AKAMATSU, Yoshinori;
Agent: KOBAYASHI, Hiromichi; c/o Shiga Patent Office, Ekisaikai Bldg., 1-29, Akashi-cho, Chuo-ku, Tokyo 1040044 (JP)
Priority Data:
2010-293853 28.12.2010 JP
2011-238623 31.10.2011 JP
2011-274084 15.12.2011 JP
(JA) ウェハの洗浄方法
Abstract: front page image
(EN)[Problem] To provide a washing method for improving washing processes in which pattern destruction is easily induced in manufacturing methods for wafers having concavoconvex patterns on the surface thereof. [Solution] This washing method for a wafer having a concavoconvex pattern on the surface has at least a step for washing a wafer (1) with a washing fluid (8), a step for replacing the washing fluid (8) that is held in concave parts (4) of the wafer (1) after washing with a water-repellant chemical solution (9), and a step for drying the wafer (1). The washing fluid (8) contains 80% by mass or more of a solvent that has a boiling point of 55 - 200°C. By setting the temperature of the water-repellent chemical solution (9) supplied in the step for replacement to 40°C or more and less than the boiling point of the water-repellent chemical solution (9), at least the surfaces of the concave parts are made water-repellent.
(FR)[Problème] L'invention concerne un procédé de lavage servant à améliorer les processus de lavage dans lesquels la destruction de motifs est facilement entraînée dans les procédés de fabrication de plaquettes ayant des motifs concavo-convexes sur leur surface. [Solution] Ce procédé de lavage pour une plaquette ayant un motif concavo-convexe sur sa surface a au moins une étape consistant à laver une plaquette (1) avec un fluide de lavage (8), une étape consistant à remplacer le fluide de lavage (8) qui est contenu dans les parties concaves (4) de la plaquette (1) après lavage par une solution chimique hydrophobe (9), et une étape consistant à sécher la plaquette (1). Le fluide de lavage (8) contient 80 % en masse ou plus d'un solvant dont le point d'ébullition est compris entre 55 et 200 °C. En réglant la température de la solution chimique hydrophobe (9) fournie dans l'étape de remplacement entre 40 °C ou plus et le point d'ébullition de la solution chimique hydrophobe (9), au moins les surfaces des parties concaves sont rendues hydrophobes.
(JA)【課題】表面に凹凸パターンを有するウェハの製造方法において、パターン倒れを誘発しやすい洗浄工程を改善するための洗浄方法を提供する。 【解決手段】表面に凹凸パターンを有するウェハの洗浄方法であって、少なくとも、前記ウェハ(1)を洗浄液(8)で洗浄する工程、洗浄後にウェハ(1)の凹部(4)に保持された洗浄液(8)を撥水性薬液(9)で置換する工程、ウェハ(1)を乾燥する工程を有し、前記洗浄液(8)が、沸点が55~200℃である溶媒を80質量%以上含むものであり、前記置換する工程において供される撥水性薬液(9)の温度を、40℃以上、該撥水性薬液(9)の沸点未満とすることにより、少なくとも前記凹部表面を撥水化させること。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)