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1. (WO2012090771) METHOD FOR FORMING VAPOR DEPOSITION FILM, AND METHOD FOR PRODUCING DISPLAY DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/090771    International Application No.:    PCT/JP2011/079441
Publication Date: 05.07.2012 International Filing Date: 20.12.2011
IPC:
H05B 33/10 (2006.01), C23C 14/04 (2006.01), C23C 14/24 (2006.01), G09F 9/30 (2006.01), H01L 27/32 (2006.01), H01L 51/50 (2006.01), H05B 33/04 (2006.01)
Applicants: SHARP KABUSHIKI KAISHA [JP/JP]; 22-22, Nagaike-cho, Abeno-ku, Osaka-shi, Osaka 5458522 (JP) (For All Designated States Except US).
SONODA, Tohru; (For US Only).
KAWATO, Shinichi; (For US Only).
INOUE, Satoshi; (For US Only).
HASHIMOTO, Satoshi; (For US Only)
Inventors: SONODA, Tohru; .
KAWATO, Shinichi; .
INOUE, Satoshi; .
HASHIMOTO, Satoshi;
Agent: HARAKENZO WORLD PATENT & TRADEMARK; Daiwa Minamimorimachi Building, 2-6, Tenjinbashi 2-chome Kita, Kita-ku, Osaka-shi, Osaka 5300041 (JP)
Priority Data:
2010-291201 27.12.2010 JP
Title (EN) METHOD FOR FORMING VAPOR DEPOSITION FILM, AND METHOD FOR PRODUCING DISPLAY DEVICE
(FR) PROCÉDÉ DE FORMATION DE FILM PAR DÉPÔT EN PHASE VAPEUR ET PROCÉDÉ DE PRODUCTION DE DISPOSITIF D'AFFICHAGE
(JA) 蒸着膜の形成方法及び表示装置の製造方法
Abstract: front page image
(EN)On the surface of a substrate (3) on which a vapor deposition firm is to be formed, photoresist (13) is formed so as to have an opening in the sealed region formed by sealing resin (11) in a pane shape including a display area (R1). Subsequently, light-emitting layers (8R, 8G, 8B) having striped patterns are formed, after which photoresist (13) is removed using a release solution, to form light-emitting layers (8R, 8G, 8B) with high-definition patterning.
(FR)L'invention concerne une résine photosensible (13) formée sur la surface d'un substrat (3) sur laquelle un film est formé par dépôt en phase vapeur, afin d'obtenir une ouverture dans une région d'étanchéité formée au moyen d'une résine d'étanchéité (11) sous forme de vitre comprenant une zone d'affichage (R1). Puis, des couches électroluminescentes (8R, 8G, 8B) dotées de motifs en bande sont formées, et la résine photosensible (13) est éliminée au moyen d'une solution de libération pour former des couches électroluminescentes (8R, 8G, 8B) à motifs haute définition.
(JA)基板(3)において蒸着膜が形成される面に、フォトレジスト(13)を、表示領域(R1)を含む封止樹脂(11)が枠状に形成される封止領域内において、開口部を有するように形成し、その後、ストライプ状のパターンを有する発光層(8R・8G・8B)を形成し、その後にフォトレジスト(13)を剥離液で除去し、高精細にパターニングされた発光層(8R・8G・8B)を形成する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)