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1. WO2012089072 - INFRARED SENSITIVE AND CHEMICAL TREATMENT FREE PHOTOSENSITIVE COMPOSITION AND LITHOGRAPHIC PLATE FABRICATED BY USING SAME

Publication Number WO/2012/089072
Publication Date 05.07.2012
International Application No. PCT/CN2011/084553
International Filing Date 23.12.2011
IPC
G03F 7/027 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F 7/004 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
CPC
B41C 1/1008
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
1Forme preparation
10for lithographic printing; Master sheets for transferring a lithographic image to the forme
1008by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
B41C 1/1016
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
1Forme preparation
10for lithographic printing; Master sheets for transferring a lithographic image to the forme
1008by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
1016characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
B41C 2201/02
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
2201Location, type or constituents of the non-imaging layers in lithographic printing formes
02Cover layers; Protective layers
B41C 2201/14
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
2201Location, type or constituents of the non-imaging layers in lithographic printing formes
14characterised by macromolecular organic compounds, e.g. binder, adhesives
B41C 2210/02
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
2210Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
02Positive working, i.e. the exposed (imaged) areas are removed
B41C 2210/04
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
2210Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
04Negative working, i.e. the non-exposed (non-imaged) areas are removed
Applicants
  • 乐凯华光印刷科技有限公司 LUCKY HUAGUANG GRAPHICS CO., LTD [CN]/[CN] (AllExceptUS)
  • 滕方迁 TENG, Fangqian [CN]/[CN] (UsOnly)
  • 杨青海 YANG, Qinghai [CN]/[CN] (UsOnly)
  • 宋小伟 SONG, Xiaowei [CN]/[CN] (UsOnly)
  • 李合成 LI, Hecheng [CN]/[CN] (UsOnly)
  • 吴兆阳 WU, Zhaoyang [CN]/[CN] (UsOnly)
  • 吴俊君 WU, Junjun [CN]/[CN] (UsOnly)
  • 陈小红 CHEN, Xiaohong [CN]/[CN] (UsOnly)
  • 刘东黎 LIU, Dongli [CN]/[CN] (UsOnly)
Inventors
  • 滕方迁 TENG, Fangqian
  • 杨青海 YANG, Qinghai
  • 宋小伟 SONG, Xiaowei
  • 李合成 LI, Hecheng
  • 吴兆阳 WU, Zhaoyang
  • 吴俊君 WU, Junjun
  • 陈小红 CHEN, Xiaohong
  • 刘东黎 LIU, Dongli
Agents
  • 郑州中原专利事务所有限公司 ZHENGZHOU ZHONGYUAN PATENT AGENCY LTD
Priority Data
201010614939.930.12.2010CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) INFRARED SENSITIVE AND CHEMICAL TREATMENT FREE PHOTOSENSITIVE COMPOSITION AND LITHOGRAPHIC PLATE FABRICATED BY USING SAME
(FR) COMPOSITION PHOTOSENSIBLE SENSIBLE À L'INFRAROUGE ET SANS TRAITEMENT CHIMIQUE, ET PLAQUE LITHOGRAPHIQUE FABRIQUÉE EN L'UTILISANT
(ZH) 红外线敏感的免化学处理感光组成物和用其制作的平印版
Abstract
(EN)
Disclosed is an infrared sensitive and chemical treatment free photosensitive composition, comprising, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable prepolymer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long press run length.
(FR)
La présente invention concerne une composition photosensible sensible à l'infrarouge et sans traitement chimique comprenant, sur la base du pourcentage en poids, de 30 à 70 % d'une résine de réticulation thermique hydrosoluble, de 1 à 20 % d'une résine de photoréticulation polymérisée et hydrosoluble, de 10 à 50 % d'un prépolymère photopolymérisable, de 1 à 30 % d'un monomère multifonctionnel, de 1 à 20 % d'un initiateur de photopolymérisation cationique et de 1 à 20 % d'un colorant d'absorption de rayonnement infrarouge. La composition photosensible de la présente invention est utile pour la préparation d'une plaque lithographique sensible à l'infrarouge et sans traitement chimique. La plaque lithographique de la présente invention présente une grande sensibilité et une réduction satisfaisante des points de maillage. De plus, après une exposition à une source de lumière infrarouge, elle peut être imprimée directement après avoir été lavée à l'eau courante, ou sans lavage ni étape de traitement, et elle possède une grande longueur de tirage.
(ZH)
本发明公开了一种红外线敏感的免化学处理感光组成物,按重量百分比计它包含:水溶性热交联树脂30-70%,水溶性光交联\聚合树脂1-20%,可光聚合的预聚体10-50%,多官能团单体1-30%,阳离子光聚合引发剂1-20%,红外光辐射吸收染料1-20%。本发明感光组成物适合于制备免化学处理的红外线敏感的平印版,本发明平印版感光度高、网点还愿性好,在用红外线光源曝光后可直接用自来水冲洗或不经任何冲洗加工步骤即可上机印刷,并可得到高的耐印力。
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