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1. WO2012067742 - PHOTOPOLYMER PRINTING PLATES WITH IN SITU NON-DIRECTIONAL FLOOR FORMED DURING EXTRUSION

Publication Number WO/2012/067742
Publication Date 24.05.2012
International Application No. PCT/US2011/056334
International Filing Date 14.10.2011
IPC
G03F 7/033 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032with binders
033the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
CPC
G03F 7/033
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032with binders
033the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G03F 7/092
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
092characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
G03F 7/11
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
11having cover layers or intermediate layers, e.g. subbing layers
Applicants
  • MACDERMID PRINTING SOLUTIONS, LLC [US]/[US] (AllExceptUS)
  • CHOI, Jonghan [US]/[US] (UsOnly)
  • O'BRATE, Kerry [US]/[US] (UsOnly)
  • BOUKAFTANE, Choualb [FR]/[US] (UsOnly)
Inventors
  • CHOI, Jonghan
  • O'BRATE, Kerry
  • BOUKAFTANE, Choualb
Agents
  • CORDANI, John, L.
Priority Data
12/949,09518.11.2010US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PHOTOPOLYMER PRINTING PLATES WITH IN SITU NON-DIRECTIONAL FLOOR FORMED DURING EXTRUSION
(FR) PLAQUES D'IMPRESSION EN PHOTOPOLYMÈRE À SEMELLE NON DIRECTIONNELLE FORMÉE IN SITU PENDANT L'EXTRUSION
Abstract
(EN)
A photocurable relief image printing element is provided. The relief image printing element comprises at least a backing layer and at least one photocurable layer on the backing layer, The photocurable layer comprises at least one binder, at least one ethylenically unsaturated monomer, at least one photoinitiator, and an effective amount of a syndiotactic 1,2-polybutadine. The presence of the syndiotactic 1,2-polybutadiene results in a photocurable layer that exhibits minimal cold flow and good storage stability.
(FR)
Cette invention concerne un élément d'impression d'image en relief photodurcissable, ledit élément d'impression d'image en relief photodurcissable comprenant au moins une couche de support et au moins une couche photodurcissable sur la couche de support. La couche photodurcissable comprend au moins un liant, au moins un monomère à insaturation éthylénique, au moins un photoamorceur, et une quantité efficace de 1,2-polybutadiène syndiotactique. La présence du 1,2-polybutadiène syndiotactique donne une couche photodurcissable qui présente un écoulement à froid minimal et une bonne stabilité au stockage.
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