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1. WO2012067652 - HYDROGEN COGAS FOR CARBON IMPLANT

Publication Number WO/2012/067652
Publication Date 24.05.2012
International Application No. PCT/US2011/001912
International Filing Date 17.11.2011
IPC
H01J 37/317 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
CPC
H01J 2237/006
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
006Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece,
H01J 2237/08
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
06Sources
08Ion sources
H01J 27/022
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
27Ion beam tubes
02Ion sources; Ion guns
022Details
H01J 37/08
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
08Ion sources; Ion guns
H01J 37/3171
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
3171for ion implantation
Applicants
  • AXCELIS TECHNOLOGIES, INC. [US]/[US] (AllExceptUS)
  • COLVIN, Neil [US]/[US] (UsOnly)
  • HSIEH, Tseh-Jen [US]/[US] (UsOnly)
Inventors
  • COLVIN, Neil
  • HSIEH, Tseh-Jen
Priority Data
12/948,36917.11.2010US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) HYDROGEN COGAS FOR CARBON IMPLANT
(FR) HYDROGÈNE EN TANT QUE GAZ COMPLÉMENTAIRE POUR IMPLANTATION DE CARBONE
Abstract
(EN)
A system, apparatus and method for increasing ion source lifetime in an ion implanter are provided. Oxidation of the ion source and ion source chamber poisoning resulting from a carbon and oxygen-containing source gas is controlled by utilizing a hydrogen co-gas, which reacts with free oxygen atoms to form hydroxide and water.
(FR)
L'invention concerne un système, un appareil et un procédé destinés à allonger la durée de vie d'une source d'ions dans un implanteur ionique. L'oxydation de la source d'ions et l'empoisonnement de la chambre d'ionisation résultant d'un gaz source contenant du carbone et de l'oxygène sont régulés par l'utilisation d'un gaz complémentaire d'hydrogène qui réagit avec des atomes d'oxygène libres pour former un hydroxyde et de l'eau.
Latest bibliographic data on file with the International Bureau