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1. WO2012063643 - ALKALI-FREE GLASS

Publication Number WO/2012/063643
Publication Date 18.05.2012
International Application No. PCT/JP2011/074632
International Filing Date 26.10.2011
IPC
C03C 3/087 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3Glass compositions
04containing silica
076with 40% to 90% silica by weight
083containing aluminium oxide or an iron compound
085containing an oxide of a divalent metal
087containing calcium oxide, e.g. common sheet or container glass
C03C 3/091 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3Glass compositions
04containing silica
076with 40% to 90% silica by weight
089containing boron
091containing aluminium
H01L 51/50 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H05B 33/02 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33Electroluminescent light sources
02Details
CPC
C03C 3/087
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3Glass compositions
04containing silica
076with 40% to 90% silica, by weight
083containing aluminium oxide or an iron compound
085containing an oxide of a divalent metal
087containing calcium oxide, e.g. common sheet or container glass
C03C 3/091
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3Glass compositions
04containing silica
076with 40% to 90% silica, by weight
089containing boron
091containing aluminium
H01L 27/3225
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes [OLED]
3225OLED integrated with another component
H01L 27/3274
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes [OLED]
3241Matrix-type displays
3244Active matrix displays
3274including organic thin film transistors [OTFT]
H01L 51/0096
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
0096Substrates
H05B 33/02
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33Electroluminescent light sources
02Details
Applicants
  • 日本電気硝子株式会社 NIPPON ELECTRIC GLASS CO., LTD. [JP]/[JP] (AllExceptUS)
  • 川口 貴弘 KAWAGUCHI Takahiro [JP]/[JP] (UsOnly)
  • 三和 晋吉 MIWA Shinkichi [JP]/[JP] (UsOnly)
Inventors
  • 川口 貴弘 KAWAGUCHI Takahiro
  • 三和 晋吉 MIWA Shinkichi
Agents
  • 城村 邦彦 SHIROMURA Kunihiko
Priority Data
61/41103008.11.2010US
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) ALKALI-FREE GLASS
(FR) VERRE SANS ALCALI
(JA) 無アルカリガラス
Abstract
(EN)
This alkali-free glass is characterized by comprising, as a glass composition, 58-70% of SiO2, 15.5-20% of Al2O3, 0-1% of B2O3, 0-5% of MgO, 3.5-16% of CaO, 0.5-6.5% of SrO and 5-15% of BaO, in mass%, by substantially not comprising alkali metal oxide, and by having a strain point higher than 725°C.
(FR)
Le verre sans alkali ci-décrit est caractérisé en ce qu'il comprend, à titre de composition de verre, 58-70 % de SiO2, 15,5-20 % d'Al2O3, 0-1 % de B2O3, 0-5 % de MgO, 3,5-16 % de CaO, 0,5-6,5 % de SrO et 5-15 % de BaO, en % en poids, en ce qu'il ne contient sensiblement pas d'oxyde métallique alcalin, et en ce qu'il a un point de contrainte supérieur à 725°C.
(JA)
本発明の無アルカリガラスは、ガラス組成として、質量%で、SiO 58~70%、Al 15.5~20%、B 0~1%、MgO 0~5%、CaO 3.5~16%、SrO 0.5~6.5%、BaO 5~15%を含有し、実質的にアルカリ金属酸化物を含有せず、歪点が725℃より高いことを特徴とする。
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