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1. WO2012063633 - EXPOSURE METHOD AND EXPOSURE POSITION VERIFICATION METHOD

Publication Number WO/2012/063633
Publication Date 18.05.2012
International Application No. PCT/JP2011/074456
International Filing Date 24.10.2011
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02F 1/1337 2006.01
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333Constructional arrangements
1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
H01L 21/027 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
CPC
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G03F 7/70791
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70791Large workpieces, e.g. in the shape of web or polygon
G03F 9/00
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Applicants
  • 株式会社ブイ・テクノロジー V Technology Co., Ltd. [JP]/[JP] (AllExceptUS)
  • 梶山 康一 KAJIYAMA, Koichi [JP]/[JP] (UsOnly)
  • 新井 敏成 ARAI, Toshinari [JP]/[JP] (UsOnly)
  • 橋本 和重 HASHIMOTO, Kazushige [JP]/[JP] (UsOnly)
Inventors
  • 梶山 康一 KAJIYAMA, Koichi
  • 新井 敏成 ARAI, Toshinari
  • 橋本 和重 HASHIMOTO, Kazushige
Agents
  • 藤巻 正憲 FUJIMAKI, Masanori
Priority Data
2010-25311311.11.2010JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) EXPOSURE METHOD AND EXPOSURE POSITION VERIFICATION METHOD
(FR) PROCÉDÉ D'EXPOSITION ET PROCÉDÉ DE VÉRIFICATION DE LA POSITION D'EXPOSITION
(JA) 露光方法及び露光位置の確認方法
Abstract
(EN)
A member to be exposed (2) comprises an exposure pattern forming region, and a non-pattern forming region in at least a portion of the periphery thereof. When either applying a coating of a light-induced color changing material which changes color when illuminated with exposure light, or attaching a light-induced color changing member which changes color when illuminated with exposure light, to a region along the length of an exposure pattern in the non-pattern forming region of the member to be exposed (2), and illuminating same with exposure light which passes through a mask, the light-induced color changing region (22) comprising either the light-induced color changing material or the light-induced color changing member is illuminated together with the exposure pattern forming region and changes color. The exposure position in the exposure pattern forming region is verified, and the quality of the exposure adjudicated, by the change of color of the light-induced color changing region (22). It is thus easy to verify the exposure position either when dividing and exposing the exposure pattern forming region a plurality of times, or when either simultaneously or continuously making exposures of a plurality of the exposure pattern forming regions.
(FR)
La présente invention se rapporte à un élément qui doit être exposé (2) qui comprend une région formant un motif d'exposition et une région ne formant aucun motif dans au moins une partie de la périphérie de ce dernier. Soit lors de l'application d'un revêtement d'un matériau changeant de couleur en fonction de la lumière induite qui change de couleur lorsqu'il est éclairé avec une lumière d'exposition, soit lors de la fixation d'un élément changeant de couleur en fonction de la lumière induite qui change de couleur lorsqu'il est éclairé avec une lumière d'exposition, à une région sur toute la longueur d'un motif d'exposition dans la région ne formant aucun motif de l'élément qui doit être exposé (2) et lors de éclairage de ce dernier avec une lumière d'exposition qui passe à travers un masque, la région changeant de couleur en fonction de la lumière induite (22) qui comprend soit le matériau changeant de couleur en fonction de la lumière induite, soit l'élément changeant de couleur en fonction de la lumière induite est éclairé conjointement avec la région formant un motif d'exposition et change de couleur. La position d'exposition dans la région formant un motif d'exposition est vérifiée et la qualité de l'exposition est déterminée par le changement de couleur de la région changeant de couleur en fonction de la lumière induite (22). Il est donc facile de vérifier la position d'exposition soit en divisant et en exposant une pluralité de fois la région formant un motif d'exposition, soit en réalisant en même temps et de façon continue des expositions d'une pluralité de régions formant un motif d'exposition.
(JA)
 露光対象部材(2)は、露光パターン形成用領域及びその周囲の少なくとも一部の非パターン形成領域を備えている。この露光対象部材(2)の非パターン形成領域における露光パターンの延長上にある領域に露光光の照射により変色する光変色材料を塗布するか、又は露光光の照射により変色する光変色部材を貼付し、マスクに透過させた露光光を露光対象部材に照射する際に、露光パターン形成用領域の他に、光変色材料又は光変色部材からなる光変色領域(22)にも照射してこれを変色させる。そして、この光変色領域(22)の変色により、露光パターン形成領域における露光位置を確認し、露光不良の有無を判定する。これにより、露光パターン形成用領域を複数回に分けて露光する場合、又は複数の露光パターン形成用領域を同時若しくは連続的に露光する場合に、露光位置の確認が容易である。
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