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1. WO2012060205 - TEMPLATE PROCESSING METHOD, COMPUTER STORAGE MEDIUM, AND TEMPLATE PROCESSING DEVICE

Publication Number WO/2012/060205
Publication Date 10.05.2012
International Application No. PCT/JP2011/073825
International Filing Date 17.10.2011
IPC
H01L 21/027 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
B29C 33/58 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33Moulds or cores; Details thereof or accessories therefor
56Coatings; Releasing, lubricating or separating agents
58Applying the releasing agents
CPC
B29C 33/58
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33Moulds or cores; Details thereof or accessories therefor
56Coatings ; , e.g. enameled or galvanised; Releasing, lubricating or separating agents
58Applying the releasing agents
B82Y 10/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
10Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
B82Y 40/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
40Manufacture or treatment of nanostructures
G03F 7/0002
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Applicants
  • 東京エレクトロン株式会社 TOKYO ELECTRON LIMITED [JP]/[JP] (AllExceptUS)
  • 広城 幸吉 HIROSHIRO, Koukichi [JP]/[JP] (UsOnly)
  • 西 孝典 NISHI, Takanori [JP]/[JP] (UsOnly)
  • 寺田 正一 TERADA, Shoichi [JP]/[JP] (UsOnly)
  • 北野 高広 KITANO, Takahiro [JP]/[JP] (UsOnly)
Inventors
  • 広城 幸吉 HIROSHIRO, Koukichi
  • 西 孝典 NISHI, Takanori
  • 寺田 正一 TERADA, Shoichi
  • 北野 高広 KITANO, Takahiro
Agents
  • 萩原 康司 HAGIWARA, Yasushi
Priority Data
2010-24689002.11.2010JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) TEMPLATE PROCESSING METHOD, COMPUTER STORAGE MEDIUM, AND TEMPLATE PROCESSING DEVICE
(FR) PROCÉDÉ DE TRAITEMENT À GABARIT, SUPPORT DE STOCKAGE INFORMATIQUE ET DISPOSITIF DE TRAITEMENT À GABARIT
(JA) テンプレート処理方法、コンピュータ記憶媒体及びテンプレート処理装置
Abstract
(EN)
The present invention pertains to a template processing method for coating a treatment fluid on a pattern region which is formed with a predetermined pattern on the surface of a template and for processing the pattern region. The method involves covering the pattern region with at least the coating surface of a treatment fluid coating tool for coating treatment fluid on the pattern region, arranging the treatment fluid coating tool so as to face the template such that the distance between the coating surface and the template region becomes a distance in which the treatment fluid produces a capillary effect, supplying the treatment fluid from the treatment fluid coating tool between the coating surface and the pattern region, and then diffusing the supplied treatment fluid only on the pattern region by means of the capillary effect.
(FR)
Cette invention concerne un procédé de traitement à gabarit destiné au revêtement d'une zone à motif par un fluide de traitement et au traitement de la zone à motif, ladite zone à motif étant formée avec un motif prédéterminé sur la surface d'un gabarit. Le procédé de l'invention comprend les étapes consistant à : recouvrir la zone à motif au moins de la surface de revêtement d'un outil de revêtement de fluide de traitement pour revêtir la zone à motif de fluide de traitement, agencer l'outil de revêtement de fluide de traitement de manière face au gabarit de telle façon que la distance entre la surface de revêtement et la région du gabarit soit une distance à laquelle le traitement de fluide produit un effet capillaire, fournir le fluide de traitement provenant de l'outil de revêtement de fluide de traitement entre la surface de revêtement et la zone à motif, et enfin diffuser le fluide de traitement ainsi fourni uniquement sur la zone à motif par ledit effet capillaire.
(JA)
 本発明は、テンプレートの表面において所定パターンが形成されたパターン領域上に処理液を塗布し、当該パターン領域を処理するテンプレート処理方法であって、パターン領域上に処理液を塗布するための処理液塗布治具の塗布面が少なくとも前記パターン領域を覆い、且つ塗布面と前記パターン領域との間の距離が処理液の毛細管現象を発生させる距離となるように、処理液塗布治具をテンプレートに対向して配置し、その後、塗布面とパターン領域との間に、処理液塗布治具から処理液を供給し、その後、供給された処理液を毛細管現象によってパターン領域上にのみ拡散させる。
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