Processing

Please wait...

Settings

Settings

Goto Application

1. WO2012057993 - COLLOIDAL LITHOGRAPHY METHODS FOR FABRICATING PARTICLE PATTERNS ON SUBSTRATE SURFACES

Publication Number WO/2012/057993
Publication Date 03.05.2012
International Application No. PCT/US2011/055604
International Filing Date 10.10.2011
IPC
G03F 7/16 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
16Coating processes; Apparatus therefor
G03F 7/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
CPC
B82Y 10/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
10Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
B82Y 40/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
40Manufacture or treatment of nanostructures
G03F 7/0002
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
G03F 7/165
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
16Coating processes; Apparatus therefor
165Monolayers, e.g. Langmuir-Blodgett
Applicants
  • THE UNIVERSITY OF AKRON [US]/[US] (AllExceptUS)
  • JIA, Li [US]/[US] (UsOnly)
  • BHAWALKAR, Sarang Pramod [IN]/[US] (UsOnly)
  • QIAN, Jun [CN]/[CN] (UsOnly)
Inventors
  • JIA, Li
  • BHAWALKAR, Sarang Pramod
  • QIAN, Jun
Agents
  • WEBER, Mark L.
Priority Data
61/391,20408.10.2010US
61/391,82811.10.2010US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) COLLOIDAL LITHOGRAPHY METHODS FOR FABRICATING PARTICLE PATTERNS ON SUBSTRATE SURFACES
(FR) PROCÉDÉS DE LITHOGRAPHIE COLLOÏDALE POUR FABRIQUER DES MOTIFS DE PARTICULES MICROSCOPIQUES ET NANOMÉTRIQUES SUR DES SURFACES DE SUBSTRAT
Abstract
(EN)
A method of surface patterning by transferring particles interfacially trapped at a air-water interface to a substrate includes the steps of: (a) interfacially trapping a plurality of particles at an air-water interface; (b) providing a substrate having a polymer adhesive thereon, the polymer adhesive having a glass transition temperature that is less than 25° C and an advancing water contact angle greater than 50; and (c) transferring the particles of step (a) to the substrate of (b) by the Langmuir-Schaefer technique.
(FR)
La présente invention concerne un procédé de modelage de surface par transfert de particules piégées de façon interfaciale à une interface air-eau sur un substrat qui comprend les étapes consistant à : (a) piéger de façon interfaciale une pluralité de particules à une interface air-eau ; (b) fournir un substrat ayant un adhésif polymère sur celui-ci, l'adhésif polymère ayant une température de transition vitreuse qui est inférieure à 25 °C et un angle de contact avec l'eau à l'avancée supérieur à 50 ; et (c) transférer les particules de l'étape (a) sur le substrat de (b) par la technique de Langmuir-Schaefer.
Also published as
Latest bibliographic data on file with the International Bureau