Processing

Please wait...

Settings

Settings

Goto Application

1. WO2012055833 - DEVICE FOR HOMOTHETIC PROJECTION OF A PATTERN ONTO THE SURFACE OF A SAMPLE, AND LITHOGRAPHY METHOD USING SUCH A DEVICE

Publication Number WO/2012/055833
Publication Date 03.05.2012
International Application No. PCT/EP2011/068587
International Filing Date 25.10.2011
IPC
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02B 15/14 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
15Optical objectives with means for varying the magnification
14by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
G02B 21/02 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21Microscopes
02Objectives
CPC
G02B 21/0016
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21Microscopes
0004specially adapted for specific applications
0016Technical microscopes, e.g. for inspection or measuring in industrial production processes
G02B 21/025
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21Microscopes
02Objectives
025with variable magnification
G02B 21/06
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21Microscopes
06Means for illuminating specimens
G02B 21/082
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21Microscopes
06Means for illuminating specimens
08Condensers
082for incident illumination only
G02B 21/086
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21Microscopes
06Means for illuminating specimens
08Condensers
086for transillumination only
G03F 7/70216
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
Applicants
  • COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES [FR]/[FR] (AllExceptUS)
  • POLESEL, Jerôme [FR]/[FR] (UsOnly)
Inventors
  • POLESEL, Jerôme
Agents
  • LEBKIRI, Alexandre
Priority Data
105897229.10.2010FR
Publication Language French (fr)
Filing Language French (FR)
Designated States
Title
(EN) DEVICE FOR HOMOTHETIC PROJECTION OF A PATTERN ONTO THE SURFACE OF A SAMPLE, AND LITHOGRAPHY METHOD USING SUCH A DEVICE
(FR) DISPOSITIF DE PROJECTION HOMOTHETIQUE D'UN MOTIF A LA SURFACE D'UN ECHANTILLON, PROCEDE DE LITHOGRAPHIE UTILISANT UN TEL DISPOSITIF
Abstract
(EN) The invention relates to a device for homothetic projection of a pattern onto the surface of a sample (21) comprising a photosensitive zone. The device comprises means allowing a pattern to be projected onto the surface of the sample, and an optical system (12) allowing the size of the pattern projected onto the surface of the sample to be continuously controlled. The invention also relates to a photolithography method using such a projection device, and to a method and a kit for converting an optical microscope into such a projection device.
(FR) L'invention concerne un dispositif de projection homothétique d'un motif à la surface d'un échantillon (21) comportant une zone photosensible. Le dispositif comporte des moyens permettant de projeter un motif à la surface de l'échantillon et un système optique (12) permettant de contrôler de façon continue l'étendue du motif projeté à la surface de l'échantillon. L'invention concerne également un procédé de photolithographie utilisant un tel dispositif de projection, ainsi qu'un procédé de transformation d'un microscope optique en un tel dispositif de projection, ainsi qu'un kit de transformation d'un microscope optique en un tel dispositif de projection.
Related patent documents
Latest bibliographic data on file with the International Bureau