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1. (WO2012047991) ANNULAR AND OTHER ABLATION PROFILES FOR REFRACTIVE SURGERY SYSTEMS AND METHODS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/047991    International Application No.:    PCT/US2011/054913
Publication Date: 12.04.2012 International Filing Date: 05.10.2011
IPC:
A61F 9/008 (2006.01)
Applicants: AMO DEVELOPMENT, LLC [US/US]; 1700 E. St. Andrew Place Santa Ana, CA 92705 (US) (For All Designated States Except US).
DAI, Guang-ming [US/US]; (US) (For US Only).
BROWNELL, Michael [US/US]; (US) (For US Only)
Inventors: DAI, Guang-ming; (US).
BROWNELL, Michael; (US)
Agent: PANG, Andrew, T.; C/o Abbott Medical Optics Inc. 1700 E. St. Andrew Place Santa Ana, CA 92705 (US)
Priority Data:
12/897,946 05.10.2010 US
Title (EN) ANNULAR AND OTHER ABLATION PROFILES FOR REFRACTIVE SURGERY SYSTEMS AND METHODS
(FR) PROFILS D'ABLATION ANNULAIRES ET AUTRES POUR SYSTÈMES DE CHIRURGIE RÉFRACTIVE ET PROCÉDÉS
Abstract: front page image
(EN)Systems, methods, and computer program products are provided for the administration of annular and other ablation profiles during refractive surgery treatments. Basis data framework techniques enable the implementation of both circular and annular ablation profiles resulting in increased ablation efficiency when treating certain vision conditions. In some instances, systems or treatments involve the use of symmetric and asymmetric ablations shapes such as double spots, triple spots, quadruple spots, multiple spots, arc shapes, elliptical shapes, and the like.
(FR)L'invention concerne des systèmes, des procédés et des produits programmes d'ordinateur pour l'administration de profils d'ablation annulaires et autres pendant des traitements de chirurgie réfractive. Des techniques de structure de données de base permettent la mise en œuvre de profils d'ablation à la fois circulaires et annulaires, conduisant à une plus grande efficacité d'ablation lors du traitement de certains états de la vue. Dans certains cas, les systèmes ou les traitements entraînent l'utilisation de formes d'ablation symétriques et asymétriques, telles que des taches doubles, des taches triples, des taches quadruples, des taches multiples, des formes d'arc, des formes elliptiques et autres.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)