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Machine translation
1. (WO2012044868) USE OF AN ENDOGENOUS 2-MICRON YEAST PLASMID FOR GENE OVER EXPRESSION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/044868    International Application No.:    PCT/US2011/054099
Publication Date: 05.04.2012 International Filing Date: 29.09.2011
IPC:
C12N 15/66 (2006.01), C12N 15/81 (2006.01)
Applicants: CODEXIS, INC. [US/US]; 200 Penobscot Drive Redwood City, CA 94063 (US) (For All Designated States Except US).
HAERIZADEH, Farzad [AU/US]; (US) (For US Only).
VALLE, Fernando [US/US]; (US) (For US Only).
COTTAREL, Guillaume [FR/US]; (US) (For US Only)
Inventors: HAERIZADEH, Farzad; (US).
VALLE, Fernando; (US).
COTTAREL, Guillaume; (US)
Agent: ONUFRYK, Christina; Quine Intellectual Property Law Group, P.C. P.O. Box 458 Alameda, CA 94501 (US)
Priority Data:
61/404,409 30.09.2010 US
Title (EN) USE OF AN ENDOGENOUS 2-MICRON YEAST PLASMID FOR GENE OVER EXPRESSION
(FR) UTILISATION D'UN PLASMIDE DE LEVURE DE 2 MICROMÈTRES ENDOGÈNE POUR LA SUREXPRESSION GÉNIQUE
Abstract: front page image
(EN)Methods and compositions for making stable recombinant yeast 2 μm plasmids are provided. Homologous recombination is performed to clone a nucleic acid of interest into the yeast 2 μm plasmid. Heterologous nucleic acid subsequences are recombined between an FLP and a REP2 gene of the plasmid.
(FR)L'invention concerne des procédés et des compositions pour fabriquer des plasmides de 2 micromètres de levure recombinée. Une recombinaison homologue est effectuée pour cloner un acide nucléique d'intérêt dans un plasmide de 2 micromètres de levure. Des sous-séquences d'acide nucléique hétérologue sont recombinées entre les gènes FLP et REP2 du plasmide.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)