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1. (WO2012044608) RUBIDIUM AND CESIUM COMPOUNDS FOR TWO-PHOTON ABSORPTION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/044608    International Application No.:    PCT/US2011/053415
Publication Date: 05.04.2012 International Filing Date: 27.09.2011
IPC:
C09K 11/06 (2006.01), G02F 1/00 (2006.01)
Applicants: BATTELLE MEMORIAL INSTITUTE [US/US]; 505 King Streey Columbus, OH 43201 (US) (For All Designated States Except US).
RISSER, Steven [US/US]; (US) (For US Only)
Inventors: RISSER, Steven; (US)
Agent: CONLEY, Scott, R.; Frost Brown Todd LLC 3300 Great American Tower 301 East Fourth Street Cincinnati, OH 45202 (US)
Priority Data:
61/386,687 27.09.2010 US
Title (EN) RUBIDIUM AND CESIUM COMPOUNDS FOR TWO-PHOTON ABSORPTION
(FR) COMPOSÉS DE RUBIDIUM ET DE CÉSIUM POUR ABSORPTION BIPHOTONIQUE
Abstract: front page image
(EN)A material which electronically isolates a rubidium or cesium atom, which is bonded to only one or two oxygen atoms. This electronic isolation is manifested in narrow photoluminescence emission spectral peaks. The material may be an alkali metal compound comprises the empirical formula: AM(R])(OR)x; where A is selected from Rb and Cs; M is selected from Al, Ti and V; each R is an independently selected alkyl or aryl group, Ri is selected from alkyl alcohol, aryl alcohol, or a carboxyl group, where OR and Ri are not the same, and x is 2, 3, or 4.
(FR)La présente invention concerne un matériau qui isole électroniquement un atome de rubidium ou césium, qui est fixé à un seul ou deux atomes d'oxygène. Cette isolation électronique se manifeste par des pics spectraux d'émission de photoluminescence étroits. Le matériau peut être un composé de métal alcalin qui comprend la formule empirique : AM(R])(OR)x ; où A est choisi parmi Rb et Cs ; M est choisi parmi Al, Ti et V ; chaque R est un groupe alkyle ou aryle indépendamment choisi, Ri est choisi parmi un alcool d'alkyle, un alcool d'aryle, ou un groupe carboxyle, où OR et Ri ne sont pas identiques, et x est 2, 3, ou 4.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)