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1. (WO2012043995) WAFER ALIGNMENT-REAR SURFACE TEST DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/043995    International Application No.:    PCT/KR2011/006719
Publication Date: 05.04.2012 International Filing Date: 09.09.2011
IPC:
H01L 21/66 (2006.01), H01L 21/68 (2006.01)
Applicants: BOBOO HI-TECH CO.,LTD [KR/KR]; 197-1 Sam-dong, Gwangju-si Gyeonggi-do 464-040 (KR) (For All Designated States Except US).
KIM, Seungheuy [KR/KR]; (KR) (For US Only)
Inventors: KIM, Seungheuy; (KR)
Agent: STY PATENT LAW FIRM; #504, JooEun-Leaderstel 921, Doonsan-Dong Seo-Gu Daejeon 302-828 (KR)
Priority Data:
10-2010-0095844 01.10.2010 KR
Title (EN) WAFER ALIGNMENT-REAR SURFACE TEST DEVICE
(FR) DISPOSITIF D'ALIGNEMENT DE PLAQUETTE - DE TEST DE SURFACE ARRIÈRE
(KO) 웨이퍼 정렬-배면 검사장치
Abstract: front page image
(EN)The present invention pertains to a device for wafer alignment and a rear surface test, which is provided neighboring a wafer chuck so as to detect contaminants on a rear surface of a wafer while the wafer rotates by an orientor and the wafer chuck for the alignment of the wafer, so that a contaminated wafer may be detected and removed before the contaminated wafer is injected into a processing chamber. Therefore, it is possible to prevent damage to the processing chamber and the wafer and problems in processing due to the injection of the contaminated wafer. In addition, the detection of the contaminants on the rear surface of the wafer and the alignment of the wafer are simultaneously carried out so as to improve processing reliability and productivity.
(FR)La présente invention concerne un dispositif d'alignement de plaquette et de test de surface arrière qui est disposé à proximité d'un support de plaquette de manière à détecter des contaminants sur une surface arrière d'une plaquette alors que la plaquette est entraînée en rotation par l'orienteur et le support de plaquette pour l'alignement de la plaquette, de sorte qu'une plaquette contaminée puisse être détectée et retirée avant d'être injectée dans une chambre de traitement. Il est par conséquent possible d'empêcher que la chambre de traitement et la plaquette ne soient endommagées et d'empêcher l'apparition de problèmes de traitement en raison de l'injection de la plaquette contaminée. En outre, la détection des contaminants sur la surface arrière de la plaquette et l'alignement de la plaquette sont réalisés simultanément de manière à améliorer la fiabilité et la productivité du traitement.
(KO)본 발명은 웨이퍼의 정렬을 위해 오리엔터 및 웨이퍼 척에 의해 웨이퍼가 회전되는 동안 웨이퍼 배면의 오염물질 검지가 가능하도록 웨이퍼 척과 이웃하여 웨이퍼 정렬 배면 검사장치를 구성함으로써, 공정챔버 투입전 오염된 웨이퍼의 검출 및 제거가 가능하도록 하여 오염된 웨이퍼의 투입으로 인해 프로세서 챔버와 웨이퍼의 소손 및 공정 진행의 차질을 미연에 방지함과 아울러, 웨이퍼 배면의 오염물질 검출과 정렬을 동시에 수행하도록 함으로써 공정의 신뢰도 및 생산성을 향상시키도록 한 웨이퍼 정렬 배면 검사장치에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)