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1. (WO2012043732) FILM FORMING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/043732    International Application No.:    PCT/JP2011/072412
Publication Date: 05.04.2012 International Filing Date: 29.09.2011
IPC:
C23C 14/48 (2006.01), C01G 9/02 (2006.01), H01B 13/00 (2006.01)
Applicants: SFC CO., LTD. [JP/JP]; 11, Nihon-ohdohri, Naka-ku, Yokohama-shi, Kanagawa 2310021 (JP) (For All Designated States Except US).
SO, Jisung [KR/JP]; (JP) (For US Only).
OGASAWARA, Ariyoshi [JP/JP]; (JP) (For US Only).
SAKAMOTO, Hitoshi [JP/JP]; (JP) (For US Only)
Inventors: SO, Jisung; (JP).
OGASAWARA, Ariyoshi; (JP).
SAKAMOTO, Hitoshi; (JP)
Agent: KURIHARA, Hiroyuki; Kurihara International Patent Office, Iwasaki Bldg. 6F, 3-15, Hiroo 1-chome, Shibuya-ku, Tokyo 1500012 (JP)
Priority Data:
2010-224397 01.10.2010 JP
Title (EN) FILM FORMING METHOD
(FR) PROCÉDÉ DE FORMATION DE FILM
(JA) 成膜方法
Abstract: front page image
(EN)This film forming method forms, on a surface to be treated of a substrate, a zinc oxide film fluorine-doped by an ion beam assisted deposition method, wherein the film formation is performed by depositing an evaporation source containing zinc while irradiating with an ion beam containing fluorine ions.
(FR)L'invention concerne un procédé de formation de film qui forme, sur une surface destinée à être traitée d'un substrat, un film d'oxyde de zinc dopé au fluor par un procédé de dépôt assisté par faisceau d'ions, la formation de film étant réalisée par dépôt d'une source d'évaporation contenant du zinc tout en irradiant avec un faisceau d'ions contenant des ions fluor.
(JA)本発明の成膜方法は、基板の被処理面にイオンビームアシスト蒸着法によりフッ素ドープした酸化亜鉛膜を成膜する成膜方法であって、フッ素イオンを含むイオンビームを照射しながら、亜鉛含有蒸着源を蒸着させて成膜を行う。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)