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1. (WO2012043214) MANUFACTURING METHOD FOR GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM, AND INFORMATION RECORDING MEDIUM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/043214    International Application No.:    PCT/JP2011/070825
Publication Date: 05.04.2012 International Filing Date: 13.09.2011
IPC:
G11B 5/84 (2006.01), B24B 1/00 (2006.01), B24B 37/00 (2012.01), B24B 37/22 (2012.01), C03C 19/00 (2006.01), C03C 23/00 (2006.01), G11B 5/73 (2006.01)
Applicants: Konica Minolta Advanced Layers, Inc. [JP/JP]; 2970, Ishikawa-machi, Hachioji-shi, Tokyo 1928505 (JP) (For All Designated States Except US).
NAKAE, Hazuki [JP/JP]; (JP) (For US Only).
MORI, Toshiharu [JP/JP]; (JP) (For US Only)
Inventors: NAKAE, Hazuki; (JP).
MORI, Toshiharu; (JP)
Agent: Fukami Patent Office, p.c.; Nakanoshima Central Tower, 2-7, Nakanoshima 2-chome, Kita-ku, Osaka-shi, Osaka 5300005 (JP)
Priority Data:
2010-221538 30.09.2010 JP
Title (EN) MANUFACTURING METHOD FOR GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM, AND INFORMATION RECORDING MEDIUM
(FR) PROCÉDÉ DE FABRICATION POUR UN SUBSTRAT EN VERRE POUR UN SUPPORT D'ENREGISTREMENT D'INFORMATIONS ET SUPPORT D'ENREGISTREMENT D'INFORMATIONS
(JA) 情報記録媒体用ガラス基板の製造方法および情報記録媒体
Abstract: front page image
(EN)A manufacturing method for a glass substrate for use as an information recording medium is provided with: a step in which a glass substrate (1) is subjected to a polishing treatment using an abrasive; and a step in which the main surface of the glass substrate (1) that has been subjected to the polishing treatment is subjected to a chemical strengthening treatment. The purity of cerium oxide in the abrasive is at least 99 mass% in CeO2/TREO, and the total mass of the content of alkali earth metals is at most 10 ppm by mass. In the polishing step, a soft polishing pad is used to subject the glass substrate to the polishing treatment.
(FR)L'invention concerne un procédé de fabrication pour un substrat en verre destiné à être utilisé comme support d'enregistrement d'informations comprenant : une étape au cours de laquelle un substrat en verre (1) est soumis à un traitement de polissage en utilisant un abrasif; et une étape au cours de laquelle la surface principale du substrat en verre (1) qui a été soumise au traitement de polissage est soumise à un traitement de renforcement chimique. La pureté de l'oxyde de cérium dans l'abrasif est d'au moins 99 % massiques de CeO2/TREO et la masse totale de la teneur en métaux terreux alcalins est au maximum égale à 10 ppm massique. Dans l'étape de polissage, un tampon de polissage doux est utilisé pour soumettre le substrat en verre au traitement de polissage.
(JA) この情報記録媒体用ガラス基板の製造方法は、ガラス基板(1)に対して研磨剤を用いて研磨処理を施す工程と、上記研磨処理を施した後に上記ガラス基板(1)の主表面に化学強化処理を施す工程とを備え、上記研磨剤は、酸化セリウムの純度が、CeO/TREOで99質量%以上、かつ、アルカリ土類金属の含有量の総質量が10質量ppm以下であり、上記研磨処理において、軟質製研磨パッドを用いて、上記ガラス基板(1)に対して研磨処理を施す。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)