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Machine translation
1. (WO2012042143) METHOD AND DEVICE FOR FORMING A PLASMA BEAM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2012/042143    International Application No.:    PCT/FR2011/052090
Publication Date: 05.04.2012 International Filing Date: 14.09.2011
IPC:
H05H 1/24 (2006.01), H05H 1/54 (2006.01), H01J 27/16 (2006.01)
Applicants: ASTRIUM SAS [FR/FR]; 12, rue Pasteur F-92150 Suresnes (FR) (For All Designated States Except US).
ECOLE POLYTECHNIQUE [FR/FR]; Route de Saclay F-91128 Palaiseau (FR) (For All Designated States Except US).
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE [FR/FR]; Campus Gérard-Mégie 3, rue Michel Ange F-75016 Paris (FR) (For All Designated States Except US).
AANESLAND, Ane [NO/FR]; (FR) (For US Only).
CHABERT, Pascal [FR/FR]; (FR) (For US Only).
IRZYK, Michael [FR/FR]; (FR) (For US Only).
MAZOUFFRE, Stéphane [FR/FR]; (FR) (For US Only)
Inventors: AANESLAND, Ane; (FR).
CHABERT, Pascal; (FR).
IRZYK, Michael; (FR).
MAZOUFFRE, Stéphane; (FR)
Agent: HAUER, Bernard; Gevers France 41 Avenue de Friedland F-75008 Paris (FR)
Priority Data:
1057890 30.09.2010 FR
Title (EN) METHOD AND DEVICE FOR FORMING A PLASMA BEAM
(FR) PROCÉDÉ ET DISPOSITIF POUR LA FORMATION D'UN FAISCEAU PLASMA
Abstract: front page image
(EN)The invention relates to a method and device for forming a plasma beam. According to the invention: the quality of the electroneutrality of the plasma beam (PB) is detected (in 12 and/or 13); and the alternating polarisation potentials of the extraction and acceleration grid (4) are adjusted such that the plasma beam (PB) is at least approximately electrically neutral.
(FR)La présente invention concerne un procédé et un dispositif pour la formation d'un faisceau plasma. Selon l'invention: ·on détecte (en 12 et/ou en 13) la qualité de la neutralité électrique dudit faisceau plasma (PB); et ·on règle les potentiels alternés de polarisation de la grille d'extraction et d'accélération (4) de façon que ledit faisceau plasma (PB) soit au moins approximativement électriquement neutre.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: French (FR)
Filing Language: French (FR)