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1. (WO2011159746) IONOMER COMPOSITIONS WITH GOOD SCUFF RESISTANCE

Pub. No.:    WO/2011/159746    International Application No.:    PCT/US2011/040419
Publication Date: Dec 22, 2011 International Filing Date: Jun 15, 2011
IPC: C08L 23/08
C08L 33/02
Applicants: E. I. du Pont de Nemours and Company
CHEN, John, Chu
Inventors: CHEN, John, Chu
Title: IONOMER COMPOSITIONS WITH GOOD SCUFF RESISTANCE
Abstract:
Provided is a composition comprising a mixture of a high molecular weight (Mw between 80,000 and 500,000 Da) carboxylate functionalized ethylene terpolymer, a high molecular weight (Mw between 80,000 and 500,000 Da) carboxylate functionalized ethylene dipolymer, and a low molecular weight (Mw between 2,000 and 30,000 Da) carboxylate functionalized ethylene copolymer, wherein the carboxylic acid groups are at least partially neutralized to form salts containing zinc cations. The composition provides a good balance of hardness, flexural modulus and scuff resistance. The composition is used in films, multilayer structures and other articles of manufacture, such as golf balls.