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Machine translation
1. (WO2011156499) NANOPARTICULATE ASSISTED NANOSCALE MOLECULAR IMAGING BY MASS SPECTROMETRY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/156499    International Application No.:    PCT/US2011/039646
Publication Date: 15.12.2011 International Filing Date: 08.06.2011
IPC:
H01J 49/00 (2006.01)
Applicants: IONWERKS, INC. [US/US]; 3401 Louisiana, Suite 355 Houston, TX 77002 (US) (For All Designated States Except US).
SCHULTZ, J., Albert [US/US]; (US) (For US Only).
EGAN, Thomas, F. [US/US]; (US) (For US Only).
LEWIS, Ernest, K. [US/US]; (US) (For US Only).
ULRICH, Steven [US/US]; (US) (For US Only).
WATERS, Kelly, L. [US/US]; (US) (For US Only)
Inventors: SCHULTZ, J., Albert; (US).
EGAN, Thomas, F.; (US).
LEWIS, Ernest, K.; (US).
ULRICH, Steven; (US).
WATERS, Kelly, L.; (US)
Agent: CATENA, Gino; Fulbright & Jaworski L.L.P. Fulbright Tower 1301 McKinney, Suite 5100 Houston, TX 77010-3095 (US)
Priority Data:
61/352,678 08.06.2010 US
Title (EN) NANOPARTICULATE ASSISTED NANOSCALE MOLECULAR IMAGING BY MASS SPECTROMETRY
(FR) IMAGERIE MOLÉCULAIRE NANOSCOPIQUE ASSISTÉE NANOPARTICULAIRE PAR SPECTROMÉTRIE DE MASSE
Abstract: front page image
(EN)Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a primary ion/primary particle source.
(FR)L'invention concerne des procédés et dispositifs, spécifiquement l'utilisation d'implantations nanoparticulaires comme matrices pour des ions secondaires et plus généralement des particules secondaires. Une source de faisceau de photons ou une source de faisceau nanoparticulaire peut être utilisée comme source de désorption ou comme source d'ions primaires/particules primaires.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)