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1. (WO2011152048) SPUTTERING TARGET

Pub. No.:    WO/2011/152048    International Application No.:    PCT/JP2011/003087
Publication Date: Dec 8, 2011 International Filing Date: Jun 1, 2011
IPC: C04B 35/00
C23C 14/34
H01L 21/363
H01L 29/786
Applicants: IDEMITSU KOSAN CO., LTD.
出光興産株式会社
TOMAI, Shigekazu
笘井 重和
EBATA, Kazuaki
江端 一晃
MATSUZAKI, Shigeo
松崎 滋夫
YANO, Koki
矢野 公規
Inventors: TOMAI, Shigekazu
笘井 重和
EBATA, Kazuaki
江端 一晃
MATSUZAKI, Shigeo
松崎 滋夫
YANO, Koki
矢野 公規
Title: SPUTTERING TARGET
Abstract:
A sintered oxide material comprising oxides of indium (In), gallium (Ga) and a tripositive metal and/or a tetrapositive metal (X), which is characterized in that the ratio of the content of the metal (X) to the total content of In and Ga is 100 to 10000 ppm (by weight).