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Machine translation
1. (WO2011151785) COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/151785    International Application No.:    PCT/IB2011/052385
Publication Date: 08.12.2011 International Filing Date: 31.05.2011
IPC:
C08L 79/04 (2006.01), C25D 3/52 (2006.01)
Applicants: BASF SE [DE/DE]; 67056 Ludwigshafen (DE) (For All Designated States Except US).
SIEMER, Michael [DE/DE]; (DE) (For US Only).
RÖGER-GÖPFERT, Cornelia [DE/DE]; (DE) (For US Only).
MEIER, Nicole [DE/DE]; (DE) (For US Only).
RAETHER, Roman, Benedikt [DE/DE]; (DE) (For US Only).
ARNOLD, Marco [DE/DE]; (DE) (For US Only).
EMNET, Charlotte [DE/DE]; (DE) (For US Only).
MAYER, Dieter [DE/DE]; (DE) (For US Only).
FLÜGEL, Alexander [DE/DE]; (DE) (For US Only).
BASF (CHINA) COMPANY LIMITED [CN/CN]; 300 Jiangxinsha Road Shanghai, 200137 (CN) (MN only)
Inventors: SIEMER, Michael; (DE).
RÖGER-GÖPFERT, Cornelia; (DE).
MEIER, Nicole; (DE).
RAETHER, Roman, Benedikt; (DE).
ARNOLD, Marco; (DE).
EMNET, Charlotte; (DE).
MAYER, Dieter; (DE).
FLÜGEL, Alexander; (DE)
Common
Representative:
BASF SE; 67056 Ludwigshafen (DE)
Priority Data:
61/350,045 01.06.2010 US
Title (EN) COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
(FR) COMPOSITION POUR ÉLECTRODÉPOSITION MÉTALLIQUE COMPRENANT UN AGENT NIVELANT
Abstract: front page image
(EN)A composition comprising a source of metal ions and at least one leveling agent comprising a linear or branched, polymeric imidazolium compound comprising the structural unit of formula L1 (L1) wherein R1, R2, R3 are each independently selected from an H atom and an organic radical having from 1 to 20 carbon atoms, R4 is a divalent, trivalent or mutlivalent organic radical which does not comprise a hydroxyl group in the a or β position relative to the nitrogen atom of the imidazole rings. is an integer.
(FR)L'invention concerne une composition qui comprend une source d'ions métalliques et au moins un agent nivelant incluant un composé polymère d'imidazolium linéaire ou ramifié comprenant le motif structural représenté par la formule L1 (L1). Dans la formule, R1, R2, R3 sont sélectionnés chacun indépendamment entre un atome H et un radical organique doté de 1 à 20 atomes de carbone, R4 représente un radical organique divalent, trivalent ou multivalent ne comprenant pas de groupe hydroxyle en position a ou β par rapport à l'atome d'azote des noyaux imidazole, et n représente un nombre entier.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)