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Machine translation
1. (WO2011151381) SUBSTRATE FOR OPTICAL ELEMENTS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/151381    International Application No.:    PCT/EP2011/059052
Publication Date: 08.12.2011 International Filing Date: 01.06.2011
IPC:
G02B 5/08 (2006.01), G03F 1/14 (2006.01), G21K 1/06 (2006.01)
Applicants: CARL ZEISS SMT GMBH [DE/DE]; Rudolf-Eber-Str. 2 73447 Oberkochen (DE) (For All Designated States Except US).
SEITZ, Günther [DE/DE]; (DE) (For US Only).
FEDOSENKO, Gennady [DE/DE]; (DE) (For US Only).
EISERT, Frank [DE/DE]; (DE) (For US Only)
Inventors: SEITZ, Günther; (DE).
FEDOSENKO, Gennady; (DE).
EISERT, Frank; (DE)
Agent: WERNER, A.-E.; Werner & Ten Brink - Patentanwälte Partnerschaftsgesellschaft Mendelstr.11 48149 Münster (DE)
Priority Data:
10 2010 029 570.1 01.06.2010 DE
61/350,150 01.06.2010 US
Title (EN) SUBSTRATE FOR OPTICAL ELEMENTS
(FR) SUBSTRAT POUR ÉLÉMENTS OPTIQUES
Abstract: front page image
(EN)To enable the more precise interferometric measurement of their surfaces, substrates (1) for optical elements comprising at least one base layer (3) and at least one doped cover layer (2), serving as a polishing layer, are suggested, wherein the dopant concentration is such that the refractive index of the doped cover layer (2) at the interface (20) cover layer - base layer differs not more than 5% from the refractive index of the base layer (2) or wherein the dopant concentration is such that the absorption coefficient of the doped cover layer (2) at the interface (20) cover layer - substrate is more than 15% for a given wavelength in the visible wavelength.
(FR)Afin de permettre une mesure interférométrique plus précise de leurs surfaces, l'invention concerne des substrats (1) pour éléments optiques qui comprennent au moins une couche de base (3) et au moins une couche de couverture dopée (2) servant de couche de polissage, la concentration de dopant étant telle que l'indice de réfraction de la couche de couverture dopée (2) au niveau de l'interface (20) couche de couverture-couche de base ne s'écarte pas de plus de 5% de l'indice de réfraction de la couche de base (2), ou la concentration en dopant étant telle que le coefficient d'absorption de la couche de couverture dopée (2) au niveau de l'interface (20) couche de couverture-substrat est supérieur à 15 % pour une longueur d'onde données dans le spectre visible.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)