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Machine translation
1. (WO2011149194) IMPRINT DEVICE AND METHOD FOR IMPRINTING USING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2011/149194    International Application No.:    PCT/KR2011/003192
Publication Date: 01.12.2011 International Filing Date: 29.04.2011
IPC:
B29C 59/02 (2006.01), B29C 43/02 (2006.01), B29C 33/18 (2006.01)
Applicants: AP SYSTEMS INC. [KR/KR]; 605, Jung-Ri, Dongtan-Myeon, Hwaseong-Si, Gyeonggi-Do, 445-813 (KR) (For All Designated States Except US).
LEE, Chun Soo [KR/KR]; (KR) (For US Only).
LEE, Seok Jeong [KR/KR]; (KR) (For US Only)
Inventors: LEE, Chun Soo; (KR).
LEE, Seok Jeong; (KR)
Agent: NAM, Seung-Hee; 3F, Yanghwa Tower, 736-16 Yeoksam-Dong, Gangnam-Gu Seoul 135-080 (KR)
Priority Data:
10-2010-0049788 27.05.2010 KR
Title (EN) IMPRINT DEVICE AND METHOD FOR IMPRINTING USING SAME
(FR) DISPOSITIF D'IMPRESSION ET PROCÉDÉ POUR L'IMPRESSION À L'AIDE DE CE DISPOSITIF D'IMPRESSION
(KO) 임프린트 장치 및 이를 이용한 임프린트 방법
Abstract: front page image
(EN)The present invention relates to an imprint device and a method for imprinting using same. More particularly, the present invention relates to an imprint device, which can uniformly form a nano-pattern on an object to be printed, and a method for imprinting using same. According to one embodiment of the present invention, the imprint device comprises: a support unit that secures and moves the position of the object to be printed; and a template unit supporting a stamp, which is provided with a pattern on one side thereof, by vacuum adsorption, and sprays gas onto the stamp and pushes the other side thereof so that the one side of the stamp is uniformly pressed onto the object to be printed. In addition, the method for imprinting according to one embodiment of the present invention comprises the following steps: vacuum adsorbing the stamp provided with the pattern; securing the position of the object to be printed and moving same close to the stamp; and spraying gas onto the stamp and pressing so that the stamp comes into close contact with the object to be printed.
(FR)La présente invention concerne un dispositif d'impression et un procédé pour l'impression à l'aide de ce dispositif d'impression. Plus particulièrement, la présente invention concerne un dispositif d'impression, qui peut former de façon uniforme un nanomotif sur un objet à traiter, et un procédé pour l'impression qui l'utilise. Selon un mode de réalisation de la présente invention, le dispositif d'impression comporte : une unité de support qui fixe et déplace la position de l'objet à traiter, et une unité de gabarit, qui porte un tampon comportant un motif sur un côté de celui-ci par adsorption par le vide, qui pulvérise un gaz sur le tampon et qui pousse l'autre côté de celui-ci, de telle sorte qu'un côté du tampon est uniformément pressé sur l'objet à traiter. De plus, le procédé pour l'impression selon un mode de réalisation de la présente invention comporte les étapes suivantes : l'adsorption par le vide du tampon comportant le motif ; la fixation de la position de l'objet à traiter et le rapprochement de celui-ci du tampon ; la pulvérisation d'un gaz sur le tampon et l'exécution d'une pression de telle sorte que le tampon vienne en contact rapproché avec l'objet à traiter.
(KO)본 발명은 임프린트 장치 및 이를 이용한 임프린트 방법에 관한 것이다. 특히, 피처리체에 나노 패턴을 균일하게 형성할 수 있는 임프린트 장치 및 이를 이용한 임프린트 방법에 관한 것이다. 본 발명의 일실시예에 따른 임프린트 장치는 피처리체를 안착시켜 위치 이동시키는 지지 유닛과, 패턴이 일면에 형성되는 스탬프를 진공 흡착하여 지지하고, 상기 스탬프의 일면이 상기 피처리체에 균일하게 눌리도록 상기 스탬프의 타면에 가스를 분사하여 밀어주는 템플레이트 유닛을 포함한다. 또한, 본 발명의 일실시예에 따른 임프린트 방법은 패턴이 있는 스탬프를 진공 흡착하는 단계와, 피처리체를 안착시켜 상기 스탬프에 근접되도록 위치 이동시키는 단계와, 상기 스탬프에 가스를 분사하여 상기 스탬프가 상기 피처리체에 밀착되도록 가압하는 단계를 포함한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)